Optical constants of reactively-sputtered NbN films

Optical constants of reactively-sputtered NbN films

Niobium nitride films of nominal thickness 1 μm and superconducting critical temperature of 14 K were prepared by reactive d.c. magnetron sputtering. A spectroellipsometer was used to measure the pseudo-dielectric constant 〈ε〉 over the spectral interval 1.5–5.0 eV for films prepared at different nit...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Thin solid films 1993-09, Vol.232 (2), p.228-231
Hauptverfasser: Konevecki, M.W., Westra, K.L., Sullivan, B.T., Kornelson, K.E., Brett, M.J.
Format: Artikel
Sprache:eng
Schlagworte:
Condensed matter: electronic structure, electrical, magnetic, and optical properties
Exact sciences and technology
Inhomogeneous superconductors and superconducting systems
Josephson junctions arrays and wire networks
Physics
Superconductivity
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:Niobium nitride films of nominal thickness 1 μm and superconducting critical temperature of 14 K were prepared by reactive d.c. magnetron sputtering. A spectroellipsometer was used to measure the pseudo-dielectric constant 〈ε〉 over the spectral interval 1.5–5.0 eV for films prepared at different nitrogen flow rates. Spectrophotometer measurements of film reflectivity were made, which confirmed the ellipsometer results.
ISSN:0040-6090
1879-2731
DOI:10.1016/0040-6090(93)90013-F