Epitaxial growth of Pt on basal-plane sapphire: a seed film for artificially layered magnetic metal structures

The epitaxial growth of Pt on basal-plane sapphire, i.e. sapphire (0001), by molecular beam epitaxy is described. Growth is monitored in situ using X-ray photoelectron diffraction (XPD), reflection high energy electron diffraction (RHEED) and low energy electron diffraction (LEED). The structural pe...

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Veröffentlicht in:Journal of crystal growth 1993-10, Vol.133 (1), p.47-58
Hauptverfasser: Farrow, R.F.C., Harp, G.R., Marks, R.F., Rabedeau, T.A., Toney, M.F., Weller, D., Parkin, S.S.P.
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Sprache:eng
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Zusammenfassung:The epitaxial growth of Pt on basal-plane sapphire, i.e. sapphire (0001), by molecular beam epitaxy is described. Growth is monitored in situ using X-ray photoelectron diffraction (XPD), reflection high energy electron diffraction (RHEED) and low energy electron diffraction (LEED). The structural perfection of thin ( < 250 Å) films of Pt is studied using X-ray diffraction and electron microscopy. We find that Pt nucleates on the sapphire surface at 600°C as islands which are rotationally twinned about the Pt[111] axis. The epitaxial relationship is: Pt[111]‖Al 2O 3[0001] and Pt(110)‖Al 2O 3 (101̄0). Island coalescence occurs at a thickness of $ ̃ 15 Å and X-ray diffraction shows that the Pt films have a high structural perfection. Such films are nearly ideal as seed films for a variety of epitaxial magnetic multilayers and alloys.
ISSN:0022-0248
1873-5002
DOI:10.1016/0022-0248(93)90102-3