Electron beam technology—SEM to microcolumn

Electron beam technology—SEM to microcolumn

As a continued effort to improve the performance of low energy scanning electron probe systems for application in microscopy, lithography, metrology, etc., miniaturized electron beam columns, approximately 3 mm in length, demonstrating a probe size of 10 nm with a beam current of ≥1 nA at 1 keV, hav...

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Veröffentlicht in:Microelectronic engineering 1996-09, Vol.32 (1), p.113-130
Hauptverfasser: Chang, T.H.P., Thomson, M.G.R., Yu, M.L., Kratschmer, E., Kim, H.S., Lee, K.Y., Rishton, S.A., Zolgharnain, S.
Format: Artikel
Sprache:eng
Schlagworte:
Electron optics
Field emission sources
Lithography
Microfabrication
Scanning electron microscope
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Zusammenfassung:As a continued effort to improve the performance of low energy scanning electron probe systems for application in microscopy, lithography, metrology, etc., miniaturized electron beam columns, approximately 3 mm in length, demonstrating a probe size of 10 nm with a beam current of ≥1 nA at 1 keV, have been successfully developed. This paper presents current status, future directions and potential applications of these microcolumns.
ISSN:0167-9317
1873-5568
DOI:10.1016/0167-9317(95)00366-5