Nickel-gallium arsenide high-voltage power Schottky diodes
A power GaAs Schottky diode (SD) with a chemically deposited Ni barrier was designed, fabricated and tested. The diode has a reverse breakdown voltage V BR of 140 V, forward voltage drop V F (at 50 A/cm 2) of 0.7 V at 23°C, 0.5 V at 150°C and 0.3 V at 250°C, and reverse leakage current densities j R...
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Veröffentlicht in: | Solid-state electronics 1993, Vol.36 (1), p.13-18 |
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Hauptverfasser: | , , , , , |
Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | A power GaAs Schottky diode (SD) with a chemically deposited Ni barrier was designed, fabricated and tested. The diode has a reverse breakdown voltage
V
BR of 140 V, forward voltage drop
V
F
(at 50 A/cm
2) of 0.7 V at 23°C, 0.5 V at 150°C and 0.3 V at 250°C, and reverse leakage current densities
j
R
(at −50 V) of 0.1 μA/cm
2 at 23°C and 1 mA/cm
2 at 150°C. Calculated forward and reverse
I–
V characteristics using a simple self-consistent computer model are in good agreement with measured values. Calculated characteristics of a silicon SD with identical structure parameters, using the same model, show much poorer
V
BR,
V
F and
j
R values. The theoretical maximum value of
V
BR
is physically limited by the largest allowed
V
F. For a
V
F
of ⋍1.6
V, V
BR.max
is ⋍200
V in Si and ⋍800
simple technology allows manufacturing of large area GaAs Schottky diodes with average currents up to V in GaAs SDs. Our relatively 100 A. |
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ISSN: | 0038-1101 1879-2405 |
DOI: | 10.1016/0038-1101(93)90064-W |