The study of epitaxial growth of thin Cu and Ag layers on Ag(110) and Cu(110) using total current spectroscopy, AES and work function measurement

The early stages of the growth of Cu layers deposited on Ag(110) and of Ag layers on Cu(110) have been studied by Total Current Spectroscopy, in conjunction with AES and ΔΦ measurements. The results are discussed in terms of structural properties of the substrate and the adsorbate layer. Information...

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Veröffentlicht in:	Vacuum 1995-02, Vol.46 (2), p.189-194
Hauptverfasser:	Naparty, MK, Skonieczny✠, J
Format:	Artikel
Sprache:	eng
Schlagworte:	Applied sciences Cross-disciplinary physics: materials science rheology Exact sciences and technology Materials science Metals. Metallurgy Methods of deposition of films and coatings film growth and epitaxy Physics Vapor phase epitaxy growth from vapor phase
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Beschreibung
Zusammenfassung:	The early stages of the growth of Cu layers deposited on Ag(110) and of Ag layers on Cu(110) have been studied by Total Current Spectroscopy, in conjunction with AES and ΔΦ measurements. The results are discussed in terms of structural properties of the substrate and the adsorbate layer. Information on the growth types, lattice relaxation and inner potential are extracted from experimental data.
ISSN:	0042-207X 1879-2715
DOI:	10.1016/0042-207X(94)E0038-Z