Structural properties of metastable Cu-Mo solid solution thin films synthesized by magnetron sputtering

Magnetron sputtering produces Cu-Mo nano crystalline films (approx1-2 microns). The substrate is borosilcate or soda-lime glass slides. Scanning electron microscope and electron dispersive energy spectrometry show the structure and composition vary for Cu sub 1-x Mo sub x x < 0.1. The material is...

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Veröffentlicht in:Scripta Metallurgica et Materialia 1995-02, Vol.32 (3), p.353-358
Hauptverfasser: Xiao, H.Z., Yang, L.-Chung, Lai, S.L., Ma, Z., Rockett, A.
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Sprache:eng
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Zusammenfassung:Magnetron sputtering produces Cu-Mo nano crystalline films (approx1-2 microns). The substrate is borosilcate or soda-lime glass slides. Scanning electron microscope and electron dispersive energy spectrometry show the structure and composition vary for Cu sub 1-x Mo sub x x < 0.1. The material is face center cubic (FCC) Cu with Mo in solid solution. Additions of Mo increase the lattice stress because Mo is 25% larger in diameter. For Mo larger than 0.4, the film structure is body centered cubic (BCC). Increasing the Cu concentration reduce the lattice spacing in the FCC lattice. Between 0.2 to 0.4 Mo the film is a mixture of BCC and FCC.
ISSN:0956-716X
DOI:10.1016/S0956-716X(99)80064-8