Optical property of Pb(Zr, Ti)O3 thin films deposited on transparent substrates by atmospheric-pressure metal-organic chemical vapor deposition

Ferroelectric Pb(Zr, Ti)O3 (PZT) thin films were successfully deposited on PbTiO3/ITO/Corning glass and PbTiO3/(100)MgO single-crystal substrates by atmospheric-pressure metal-organic chemical vapor deposition. The PZT thin films deposited at 400 C showed poor optical transparency, while PZT thin fi...

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Veröffentlicht in:	Japanese Journal of Applied Physics 1995, Vol.34 (11), p.6112-6115
Hauptverfasser:	LEE, J. M, CHO, H. S, SHIN, J. C, KIM, H. J, KIM, D.-Y, KWUN, S.-I
Format:	Artikel
Sprache:	eng
Schlagworte:	Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.) Condensed matter: electronic structure, electrical, magnetic, and optical properties Cross-disciplinary physics: materials science rheology Exact sciences and technology Insulators Materials science Methods of deposition of films and coatings film growth and epitaxy Optical properties and condensed-matter spectroscopy and other interactions of matter with particles and radiation Optical properties of specific thin films Physics
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Zusammenfassung:	Ferroelectric Pb(Zr, Ti)O3 (PZT) thin films were successfully deposited on PbTiO3/ITO/Corning glass and PbTiO3/(100)MgO single-crystal substrates by atmospheric-pressure metal-organic chemical vapor deposition. The PZT thin films deposited at 400 C showed poor optical transparency, while PZT thin films showing high transmittance were deposited above 450 C. The PZT thin films deposited at 500 C showed an optical transparency of 80 percent and a good quadratic electro-optic effect, of which the coefficient was 1.0 x 10 exp -18 sq m/sq V. (Author)
ISSN:	0021-4922 1347-4065
DOI:	10.1143/jjap.34.6112