Visible electroluminescence from porous silicon np heterojunction diodes
We report the preparation of silicon-based visible light-emitting diodes, configured as heterojunctions between porous silicon (formed by electrochemical etching of p-type silicon wafers), and n-type indium tin oxide (ITO). The transparent ITO film allows light emission through the top surface of th...
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Veröffentlicht in: | Applied physics letters 1992-05, Vol.60 (20), p.2514-2516 |
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Hauptverfasser: | , , |
Format: | Artikel |
Sprache: | eng |
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Online-Zugang: | Volltext |
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Zusammenfassung: | We report the preparation of silicon-based visible light-emitting diodes, configured as heterojunctions between porous silicon (formed by electrochemical etching of p-type silicon wafers), and n-type indium tin oxide (ITO). The transparent ITO film allows light emission through the top surface of the device, under a forward electrical bias of several volts across the junction. Photogenerated currents are observed under reverse biases. A tentative model for this electroluminescence is presented, based on injection of minority carriers through a narrow interphase region into the porous silicon structure, where radiative recombination occurs. |
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ISSN: | 0003-6951 1077-3118 |
DOI: | 10.1063/1.106951 |