Application of frequency response analysis to the determination of cathodic discharge mechanism during silver electroplating

The ac impedance data generated from the frequency response analysis technique were used to establish the mechanism of Ag electroplating from the industrial cyanide plating bath. The deposition process involves parallel and concurrent charge-transfer reactions from more than one Ag complex. Dependin...

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Veröffentlicht in:Journal of the Electrochemical Society 1995-11, Vol.142 (11), p.3729-3734
Hauptverfasser: ASHIRU, O. A, FARR, J. P. G
Format: Artikel
Sprache:eng
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Zusammenfassung:The ac impedance data generated from the frequency response analysis technique were used to establish the mechanism of Ag electroplating from the industrial cyanide plating bath. The deposition process involves parallel and concurrent charge-transfer reactions from more than one Ag complex. Depending on the cyanide concentration in the Ag plating bath, the electrode reaction seems to proceed mostly through one of the Ag species /complexes: AgCN, Ag(CN) sub 2 exp - , or Ag(CN) sub 3 exp 2- , which are in equilibrium with each other. The discharge of Ag(CN) sub 2 exp - complex appears the predominant process, especially for bath concentrations in the range of commercial Ag cyanide plating systems. The complex plane ac impedance diagrams of the plating system, at steady state, consist of two capacitive loops at the lower frequencies, preceded by a high frequency spectrum which corresponds to the faradaic charge-transfer process. The lower frequency features are a manifestation of the surface adsorption and coverage processes by specific intermediate species like cyanide and carbonated ions in the plating bath.
ISSN:0013-4651
1945-7111
DOI:10.1149/1.2048405