Photo-assisted direct writing of conducting aluminum

We have succeeded in selective area deposition of aluminum films by ultraviolet photolytic decomposition of the organometallic complex trimethylamine alane, TMAA-AlH 3(N(CH 3) 3) 2. Both ultraviolet and visible light successfully photolysed the alane adduct and resulted in selective area deposition....

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Veröffentlicht in:	Materials science & engineering. B, Solid-state materials for advanced technology Solid-state materials for advanced technology, 1995-02, Vol.30 (1), p.L5-L8
Hauptverfasser:	Hwang, Seong-Don, Byun, Dongjin, Glass, J.A., Robertson, Brian, Spencer, J.T., Datta, S., Dowben, P.A.
Format:	Artikel
Sprache:	eng
Schlagworte:	Aluminium Applied sciences Chemical vapor deposition Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.) Cross-disciplinary physics: materials science rheology Exact sciences and technology Materials science Metals. Metallurgy Methods of deposition of films and coatings film growth and epitaxy Physics TMAA: Photolysis
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Beschreibung
Zusammenfassung:	We have succeeded in selective area deposition of aluminum films by ultraviolet photolytic decomposition of the organometallic complex trimethylamine alane, TMAA-AlH 3(N(CH 3) 3) 2. Both ultraviolet and visible light successfully photolysed the alane adduct and resulted in selective area deposition. The light sources exhibited different laser fragmentation mass spectra, suggesting somewhat different decomposition pathways.
ISSN:	0921-5107 1873-4944
DOI:	10.1016/0921-5107(94)01140-0