Structure and mechanical properties of hard W-C coatings deposited by reactive magnetron sputtering

Carbon-containing tungsten coatings and thin films were prepared using reactive magnetron sputtering of a tungsten target in Ar--CH sub 4 ambients. The composition and crystallographic structure of W--C layers were characterized by electron microprobe analyses, Rutherford backscattering spectroscopy, nuclear reaction analyses and X-ray diffraction technique. The Vickers hardness, internal stresses and electrical resistivity were determined as functions of the carbon concentration in W--C coatings or films. Their relations to the structure and composition of the deposited material are discussed. Stainless steel was used as the substrate.