Thickness control of multilayer films in laser-induced chemical vapor deposition

Thickness control of multilayer films in laser-induced chemical vapor deposition

The authors propose a sequence-control method for layer thicknesses by changing deposition time in the chemical vapor deposition with nonconstant deposition rates due to films deposited onto the laser-beam transmitting window. The method is applied to tungsten-carbon multilayer depositions using an...

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Veröffentlicht in:Japanese Journal of Applied Physics 1992-04, Vol.31 (4), p.1183-1184
Hauptverfasser: MUTOH, K, YAMADA, Y, IWABUCHI, T, MIYATA, T
Format: Artikel
Sprache:eng
Schlagworte:
Applied sciences
Condensed matter: structure, mechanical and thermal properties
Exact sciences and technology
Low-dimensional structures (superlattices, quantum well structures, multilayers): structure, and nonelectronic properties
Metals. Metallurgy
Physics
Surfaces and interfaces
thin films and whiskers (structure and nonelectronic properties)
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Beschreibung
Zusammenfassung:The authors propose a sequence-control method for layer thicknesses by changing deposition time in the chemical vapor deposition with nonconstant deposition rates due to films deposited onto the laser-beam transmitting window. The method is applied to tungsten-carbon multilayer depositions using an ArF excimer laser.
ISSN:0021-4922
1347-4065
DOI:10.1143/jjap.31.1183