Reactive deposition of cobalt electrodes. III, Role of anions
In the presence of bubbling oxygen, the most important effect of anions in the solutions is on the pathways of O reduction during reactive deposition of Co. In the presence of Cl exp -- ions, O reduction proceeds mainly through a two-electron process to form HO sub 2 exp -- and OH exp -- ions as int...
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Veröffentlicht in: | Journal of the Electrochemical Society 1990-11, Vol.137 (11), p.3387-3393 |
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Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | In the presence of bubbling oxygen, the most important effect of anions in the solutions is on the pathways of O reduction during reactive deposition of Co. In the presence of Cl exp -- ions, O reduction proceeds mainly through a two-electron process to form HO sub 2 exp -- and OH exp -- ions as intermediate products. On the other hand, O is also reduced by a two-electron pathway, but with the formation of H sub 2 O sub 2 ions as the main product in the presence of SO exp = sub 4 ions. However, in acetate solutions, a likely mechanism of O reduction is a four-electron pathway with the formation of water. During reactive deposition of Co, O reduction of Co in the absence of O. Cobalt deposition processes and the porous structure of Co electrodes are therefore directly affected by the pathways of O reduction. Graphs, Photomicrographs. 18 ref.--AA |
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ISSN: | 0013-4651 1945-7111 |
DOI: | 10.1149/1.2086226 |