Properties of CdTe/InSb heterostructures grown by temperature gradient vapor transport deposition

Heteroepitaxial films of CdTe were grown by a simple method of temperature gradient vapor transport deposition in InSb(1 1 1) orientation substrates in the growth temperature range between 180°C and 280°C. Double crystal X-ray diffraction was used to evaluate the crystal quality of the CdTe epitaxia...

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Veröffentlicht in:Solid state communications 1992, Vol.83 (11), p.927-930
Hauptverfasser: Kim, T.W., Jung, M., Chung, I.H., Lee, J.H., Park, H.L.
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Sprache:eng
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Zusammenfassung:Heteroepitaxial films of CdTe were grown by a simple method of temperature gradient vapor transport deposition in InSb(1 1 1) orientation substrates in the growth temperature range between 180°C and 280°C. Double crystal X-ray diffraction was used to evaluate the crystal quality of the CdTe epitaxial films. The full width at half-maximum intensity of the double crystal diffraction CdTe peak was as small as 30 arcsec. Room temperature capacitance-voltage measurements showed the nominally undoped CdTe layers to be n-type with N d  N a in the low 10 16 cm −3 region and excellent confinement of electrons at the CdTe/InSb heterointerfaces. Photoluminescence measurements at 15 K showed that the CdTe film grown on InSb(1 1 1) at 230°C appeared to have strong and sharp exciton transitions and weak defect-related bands.
ISSN:0038-1098
1879-2766
DOI:10.1016/0038-1098(92)90913-T