New nondestructive composition depth profiling method for diagnostics of multilayer quantum-well structures

A composition depth profiling method based on the measurement of the X-ray electron photoemission total yield is developed. When the X-ray photon energy exceeds the electron shell ionisation energies of the sample elements step-like increases of the total yield are observed. The magnitudes of the st...

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Veröffentlicht in:Surface science 1990-04, Vol.228 (1), p.532-537
Hauptverfasser: Konnikov, S.G., Pogrebitsky, K.Ju
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description A composition depth profiling method based on the measurement of the X-ray electron photoemission total yield is developed. When the X-ray photon energy exceeds the electron shell ionisation energies of the sample elements step-like increases of the total yield are observed. The magnitudes of the steps are related to the atomic concentrations; depth profiling is provided by scanning the angle of incidence of the X-rays. Examples of application of the method are presented.
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subjects Condensed matter: structure, mechanical and thermal properties
Exact sciences and technology
Physics
Surfaces and interfaces
thin films and whiskers (structure and nonelectronic properties)
title New nondestructive composition depth profiling method for diagnostics of multilayer quantum-well structures
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