A novel two component positive photoresist for deep UV lithography

A novel two component positive photoresist for deep UV lithography

Multifunctional a - diazo - β - ketoesters (DKE) 6 provide an attractive source of deep UV sensitive photoactive compounds with a broad potential for modification of their chemical, physical and lithographic properties. In combination with highly transparent resins, they offer insights into the deve...

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Veröffentlicht in:Microelectronic engineering 1990, Vol.11 (1), p.491-495
Hauptverfasser: Pawlowski, Georg, Dammel, Ralph, Lindley, Charlet R., Merrem, Hans-Joachim, Röschert, Heinz, Wilharm, Peter
Format: Artikel
Sprache:eng
Schlagworte:
Applied sciences
Electronics
Exact sciences and technology
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
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Zusammenfassung:Multifunctional a - diazo - β - ketoesters (DKE) 6 provide an attractive source of deep UV sensitive photoactive compounds with a broad potential for modification of their chemical, physical and lithographic properties. In combination with highly transparent resins, they offer insights into the development of a positive working deep UV sensitive two - component photoresist.
ISSN:0167-9317
1873-5568
DOI:10.1016/0167-9317(90)90157-O