The influence of argon ion bombardment on form birefringence in thin films of titania

Thin films of titanium oxide deposited in the presence of oxygen at oblique incidence under argon ion bombardment exhibit birefringence that depends on the energy and relative direction of the ion beam and material flux.

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Veröffentlicht in:Journal of applied physics 1992-04, Vol.71 (7), p.3201-3203
Hauptverfasser: SPRAGUE, R. W, HICKEY, C. F, HODGKINSON, I. J
Format: Artikel
Sprache:eng
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Zusammenfassung:Thin films of titanium oxide deposited in the presence of oxygen at oblique incidence under argon ion bombardment exhibit birefringence that depends on the energy and relative direction of the ion beam and material flux.
ISSN:0021-8979
1089-7550
DOI:10.1063/1.350964