Micromachining and device transplantation using focused ion beam

During the past ten years, a number of focused ion beam (FIB) applications in microelectronics have been demonstrated and steadily identified. In this paper, we will review FIB micromachining and device transplantation, in which processes of FIB sputtering, redeposition, and/or FIB-assisted depositi...

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Veröffentlicht in:Japanese Journal of Applied Physics 1990-10, Vol.29 (10), p.2283-2287
Hauptverfasser: ISHITANI, T, OHNISHI, T, KAWANAMI, Y
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Sprache:eng
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