Characterization of ion-plated silicon nitride thin films
Silicon nitride (Si 3N 4) thin films deposited at low (300 °C or below) substrate temperatures by an ion plating process are characterized. Amorphous, stoichiometric layers with hydrogen contents below 1 at.% are obtained. The microhardness is measured and the stress in the films is related to the p...
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| Veröffentlicht in: | Surface & coatings technology 1992-04, Vol.52 (2), p.187-193 |
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| container_end_page | 193 |
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| container_issue | 2 |
| container_start_page | 187 |
| container_title | Surface & coatings technology |
| container_volume | 52 |
| creator | Ramm, Juergen Pixley, Ralph E. |
| description | Silicon nitride (Si
3N
4) thin films deposited at low (300 °C or below) substrate temperatures by an ion plating process are characterized. Amorphous, stoichiometric layers with hydrogen contents below 1 at.% are obtained. The microhardness is measured and the stress in the films is related to the process conditions. The adherence of the layers is illustrated by X-ray rocking curve measurements. Tests prove the excellent corrosion resistance Si
3N
4 coatings for metallic substrates. |
| doi_str_mv | 10.1016/0257-8972(92)90045-C |
| format | Article |
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3N
4) thin films deposited at low (300 °C or below) substrate temperatures by an ion plating process are characterized. Amorphous, stoichiometric layers with hydrogen contents below 1 at.% are obtained. The microhardness is measured and the stress in the films is related to the process conditions. The adherence of the layers is illustrated by X-ray rocking curve measurements. Tests prove the excellent corrosion resistance Si
3N
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| fulltext | fulltext |
| identifier | ISSN: 0257-8972 |
| ispartof | Surface & coatings technology, 1992-04, Vol.52 (2), p.187-193 |
| issn | 0257-8972 1879-3347 |
| language | eng |
| recordid | cdi_proquest_miscellaneous_25565580 |
| source | ScienceDirect Journals (5 years ago - present) |
| subjects | Applied sciences Exact sciences and technology Metals. Metallurgy Nonmetallic coatings Production techniques Surface treatment |
| title | Characterization of ion-plated silicon nitride thin films |
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