Boron Diffusion in Co sub 74 Ti sub 26 Amorphous Alloy

Boron diffusion in implanted Co sub 74 Ti sub 26 amorphous alloy has been studied by secondary ion mass spectrometry (SIMS). Auger electron spectroscopy depth profiling, Rutherford backscattering spectroscopy, and X-ray diffraction have been used to control the crystallization and the interaction with the Si substrate. By comparing computer simulations with the SIMS profiles, the diffusion coefficients of B in Co sub 74 Ti sub 26 have been found in the temperature range between 300-400 deg C. An activation energy of 1.63 plus/minus 0.05 eV and a preexponential factor of 1.77 x 10 exp --3 cm exp 2 /s for the diffusion equation have been found. These values agree with an experimental correlation that appears to be valid for the diffusion in amorphous alloys of all elements with the exception of hydrogen.