In-situ reconstruction of non-noble multi-metal core-shell oxyfluorides for water oxidation

Electrochemical reconstruction activates the multi-metal oxyfluorides into channel-rich core–shell structure for advanced water oxidation. [Display omitted] The electrochemical anodic behavior of transition metal compounds plays an undeniably non-negligible role across many electrooxidation reaction...

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Veröffentlicht in:Journal of colloid and interface science 2021-11, Vol.602, p.55-63
Hauptverfasser: Zhu, Yin'an, Dai, Weiji, Zhong, Xu, Lu, Tao, Pan, Ye
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Sprache:eng
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Zusammenfassung:Electrochemical reconstruction activates the multi-metal oxyfluorides into channel-rich core–shell structure for advanced water oxidation. [Display omitted] The electrochemical anodic behavior of transition metal compounds plays an undeniably non-negligible role across many electrooxidation reactions. In this work, a chronopotentiometric technique was employed to activate the multicomponent non-noble metal oxyfluorides in-situ for oxygen evolution reaction (OER). It is interesting to unravel that the increasing applied current density helps to reconstruct the catalyst into nanoporous core–shell structure and introduce metal oxyhydroxide on the surface, which guarantees more channels for efficient ion/mass transportation and thus contributes to exposing more active sites for catalytic reaction. The activated five-membered oxyfluoride shows the best catalytic activity with overpotential of 348 ± 2 mV to achieve the current density of 10 mA/cm2 and a Tafel slope of 110.3 ± 0.1 mV/dec, in contrast with the pristine one (532 ± 2 mV & 240.2 ± 0.1 mV/dec). It still maintains high stability after long time OER measurement, making it a promising succedaneum for noble metal catalysts. The high-entropy effect, amorphous state and high active sites density jointly contribute to its enhanced OER performance. This work provides new ideas for realizing the potential of inactive elements via entropy engineering and using electrochemical self-reconstruction to modify semiconductors for advanced water oxidation.
ISSN:0021-9797
1095-7103
DOI:10.1016/j.jcis.2021.05.170