Angular distributions of sputtered particles from lithium-implanted aluminium and copper crystals

The anisotropy of angular distributions of sputtered ions from lithium-implanted aluminium and copper single crystals, measured by SIMS analysis, have been used to obtain information about the microstructure of the implanted layers. Sputtered Al + distributions from the {111} surface show three-fold...

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Veröffentlicht in:Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms Beam interactions with materials and atoms, 1991-07, Vol.61 (1), p.21-26
Hauptverfasser: Johansen, A., Johnson, E., Sarholt-Kristensen, L., Steenstrup, S., Andersen, H.H., Buhanov, V.M., Chernysh, V.S., Ivanov, I.N., Minnebaev, K.F.
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Sprache:eng
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Zusammenfassung:The anisotropy of angular distributions of sputtered ions from lithium-implanted aluminium and copper single crystals, measured by SIMS analysis, have been used to obtain information about the microstructure of the implanted layers. Sputtered Al + distributions from the {111} surface show three-fold symmetry with maximum intensity near the 〈110〉 and 〈100〉 directions respectively, while Li + distributions show maximum intensity only in the 〈100〉 directions. From {100] crystals the Al + distributions have four-fold symmetry while there are no preferential ejection directions for the Li + ions. This agrees conceptually with the fact that the implanted layer contains the ordered Al 3Li (δ') phase, which has earlier been observed by TEM analysis on implanted samples. In contrast, a similar study of Li + implanted copper crystals shows that the implanted lithium is randomly located.
ISSN:0168-583X
1872-9584
DOI:10.1016/0168-583X(91)95555-R