Measurement of electron energy deposition necessary to form an anode plasma in Ta, Ti, and C for coaxial bremsstrahlung diodes

Measurements are made of surface doses necessary to initiate an anode plasma by electron bombardment of Ta, Ti, and C anodes for coaxial geometries characteristic of high-power electron-beam diodes. Measured lower and upper bounds of doses necessary to form an anode plasma are 54±7–139±16 J/g in Ta,...

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Veröffentlicht in:J. Appl. Phys.; (United States) 1989-07, Vol.66 (1), p.10-22
Hauptverfasser: SANFORD, T. W. L, HALBLEIB, J. A, SPENCE, P. W, PROULX, G. A, POUKEY, J. W, PREGENZER, A. L, PATE, R. C, HEATH, C. E, MOCK, R, MASTIN, G. A, GHIGLIA, D. C, ROEMER, T. J
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Sprache:eng
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Zusammenfassung:Measurements are made of surface doses necessary to initiate an anode plasma by electron bombardment of Ta, Ti, and C anodes for coaxial geometries characteristic of high-power electron-beam diodes. Measured lower and upper bounds of doses necessary to form an anode plasma are 54±7–139±16 J/g in Ta, 214±23–294±71 J/g in Ti, and 316±33–494±52 J/g in C. Within these bounds, probable values for the threshold are given under specific assumptions. The measurements are consistent with a thermal desorption model for plasma formation.
ISSN:0021-8979
1089-7550
DOI:10.1063/1.343913