Measurement of electron energy deposition necessary to form an anode plasma in Ta, Ti, and C for coaxial bremsstrahlung diodes
Measurements are made of surface doses necessary to initiate an anode plasma by electron bombardment of Ta, Ti, and C anodes for coaxial geometries characteristic of high-power electron-beam diodes. Measured lower and upper bounds of doses necessary to form an anode plasma are 54±7–139±16 J/g in Ta,...
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Veröffentlicht in: | J. Appl. Phys.; (United States) 1989-07, Vol.66 (1), p.10-22 |
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Hauptverfasser: | , , , , , , , , , , , |
Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | Measurements are made of surface doses necessary to initiate an anode plasma by electron bombardment of Ta, Ti, and C anodes for coaxial geometries characteristic of high-power electron-beam diodes. Measured lower and upper bounds of doses necessary to form an anode plasma are 54±7–139±16 J/g in Ta, 214±23–294±71 J/g in Ti, and 316±33–494±52 J/g in C. Within these bounds, probable values for the threshold are given under specific assumptions. The measurements are consistent with a thermal desorption model for plasma formation. |
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ISSN: | 0021-8979 1089-7550 |
DOI: | 10.1063/1.343913 |