Impurity-Enhanced Intergranular Cavity Formation in Silicon Nitride at High Temperatures
The effect of trace impurities on high‐temperature strength is examined in Si3N4 sintered without additives. Strength degradation above 1000°C occurs only in the low‐purity material, which also exhibits an intergranular slow crack growth (SCG) rate 2 orders of magnitude faster than that of the high‐...
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Veröffentlicht in: | Journal of the American Ceramic Society 1991-04, Vol.74 (4), p.752-759 |
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creator | Tanaka, Isao Pezzotti, Giuseppe Matsushita, Ken-ichi Miyamoto, Yoshinari Okamoto, Taira |
description | The effect of trace impurities on high‐temperature strength is examined in Si3N4 sintered without additives. Strength degradation above 1000°C occurs only in the low‐purity material, which also exhibits an intergranular slow crack growth (SCG) rate 2 orders of magnitude faster than that of the high‐purity material at 1400°C. A relaxation peak of internal friction is observed only in the low‐purity material, at ≅1200°C, and the origin of this peak is ascribed to the initial stage of SCG—that is, the cavity‐nucleation stage, enhanced by impurities. Based on the present results, a model for impurity‐enhanced SCG is proposed. |
doi_str_mv | 10.1111/j.1151-2916.1991.tb06920.x |
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fullrecord | <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_miscellaneous_25283834</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>25283834</sourcerecordid><originalsourceid>FETCH-LOGICAL-c4842-99de5e0ab87f4c3173ee8288bd9bb23bddbd3b62cca334a53a0a6325a8e37b273</originalsourceid><addsrcrecordid>eNqVkE1vEzEQhi0EEqHwH1ZIcNvgj921zQVVIW2DqiJBoYiLNfZOWof9CLYXkn-Po0RwxpfxaN55RnoIecnonOX3ZpNLzUquWTNnWrN5srTRnM53j8iM1afRYzKjlPJSKk6fkmcxbnLLtKpm5Nuq307Bp325HB5gcNgWqyFhuA8wTB2EYgG_8rS4GEMPyY9D4Yfis--8y98bn4JvsYBUXPn7h-IW-y0GSFPA-Jw8WUMX8cWpnpEvF8vbxVV5_fFytTi_Ll2lKl5q3WKNFKyS68oJJgWi4krZVlvLhW1b2wrbcOdAiApqARQawWtQKKTlUpyR10fuNow_J4zJ9D467DoYcJyi4TVXQokqB98egy6MMQZcm23wPYS9YdQcZJqNOcg0B2PmINOcZJpdXn51ugLRQbfOdpyP_whaMs64zrl3x9xv3-H-Py6YD-eLpax5JpRHgo8Jd38JEH6YRgpZm7ubS_Ppq757r783Ros_UzqZ8A</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>25283834</pqid></control><display><type>article</type><title>Impurity-Enhanced Intergranular Cavity Formation in Silicon Nitride at High Temperatures</title><source>Wiley Journals</source><creator>Tanaka, Isao ; Pezzotti, Giuseppe ; Matsushita, Ken-ichi ; Miyamoto, Yoshinari ; Okamoto, Taira</creator><creatorcontrib>Tanaka, Isao ; Pezzotti, Giuseppe ; Matsushita, Ken-ichi ; Miyamoto, Yoshinari ; Okamoto, Taira</creatorcontrib><description>The effect of trace impurities on high‐temperature strength is examined in Si3N4 sintered without additives. Strength degradation above 1000°C occurs only in the low‐purity material, which also exhibits an intergranular slow crack growth (SCG) rate 2 orders of magnitude faster than that of the high‐purity material at 1400°C. A relaxation peak of internal friction is observed only in the low‐purity material, at ≅1200°C, and the origin of this peak is ascribed to the initial stage of SCG—that is, the cavity‐nucleation stage, enhanced by impurities. Based on the present results, a model for impurity‐enhanced SCG is proposed.</description><identifier>ISSN: 0002-7820</identifier><identifier>EISSN: 1551-2916</identifier><identifier>DOI: 10.1111/j.1151-2916.1991.tb06920.x</identifier><identifier>CODEN: JACTAW</identifier><language>eng</language><publisher>Oxford, UK: Blackwell Publishing Ltd</publisher><subject>Applied sciences ; Building materials. Ceramics. Glasses ; Ceramic industries ; Chemical industry and chemicals ; crack growth ; Exact sciences and technology ; friction ; impurities ; mechanical properties ; silicon nitride ; Structural ceramics ; Technical ceramics</subject><ispartof>Journal of the American Ceramic Society, 1991-04, Vol.74 (4), p.752-759</ispartof><rights>1991 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c4842-99de5e0ab87f4c3173ee8288bd9bb23bddbd3b62cca334a53a0a6325a8e37b273</citedby><cites>FETCH-LOGICAL-c4842-99de5e0ab87f4c3173ee8288bd9bb23bddbd3b62cca334a53a0a6325a8e37b273</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://onlinelibrary.wiley.com/doi/pdf/10.1111%2Fj.1151-2916.1991.tb06920.x$$EPDF$$P50$$Gwiley$$H</linktopdf><linktohtml>$$Uhttps://onlinelibrary.wiley.com/doi/full/10.1111%2Fj.1151-2916.1991.tb06920.x$$EHTML$$P50$$Gwiley$$H</linktohtml><link.rule.ids>314,780,784,1417,27924,27925,45574,45575</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=19712129$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>Tanaka, Isao</creatorcontrib><creatorcontrib>Pezzotti, Giuseppe</creatorcontrib><creatorcontrib>Matsushita, Ken-ichi</creatorcontrib><creatorcontrib>Miyamoto, Yoshinari</creatorcontrib><creatorcontrib>Okamoto, Taira</creatorcontrib><title>Impurity-Enhanced Intergranular Cavity Formation in Silicon Nitride at High Temperatures</title><title>Journal of the American Ceramic Society</title><description>The effect of trace impurities on high‐temperature strength is examined in Si3N4 sintered without additives. Strength degradation above 1000°C occurs only in the low‐purity material, which also exhibits an intergranular slow crack growth (SCG) rate 2 orders of magnitude faster than that of the high‐purity material at 1400°C. A relaxation peak of internal friction is observed only in the low‐purity material, at ≅1200°C, and the origin of this peak is ascribed to the initial stage of SCG—that is, the cavity‐nucleation stage, enhanced by impurities. Based on the present results, a model for impurity‐enhanced SCG is proposed.</description><subject>Applied sciences</subject><subject>Building materials. Ceramics. Glasses</subject><subject>Ceramic industries</subject><subject>Chemical industry and chemicals</subject><subject>crack growth</subject><subject>Exact sciences and technology</subject><subject>friction</subject><subject>impurities</subject><subject>mechanical properties</subject><subject>silicon nitride</subject><subject>Structural ceramics</subject><subject>Technical ceramics</subject><issn>0002-7820</issn><issn>1551-2916</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>1991</creationdate><recordtype>article</recordtype><recordid>eNqVkE1vEzEQhi0EEqHwH1ZIcNvgj921zQVVIW2DqiJBoYiLNfZOWof9CLYXkn-Po0RwxpfxaN55RnoIecnonOX3ZpNLzUquWTNnWrN5srTRnM53j8iM1afRYzKjlPJSKk6fkmcxbnLLtKpm5Nuq307Bp325HB5gcNgWqyFhuA8wTB2EYgG_8rS4GEMPyY9D4Yfis--8y98bn4JvsYBUXPn7h-IW-y0GSFPA-Jw8WUMX8cWpnpEvF8vbxVV5_fFytTi_Ll2lKl5q3WKNFKyS68oJJgWi4krZVlvLhW1b2wrbcOdAiApqARQawWtQKKTlUpyR10fuNow_J4zJ9D467DoYcJyi4TVXQokqB98egy6MMQZcm23wPYS9YdQcZJqNOcg0B2PmINOcZJpdXn51ugLRQbfOdpyP_whaMs64zrl3x9xv3-H-Py6YD-eLpax5JpRHgo8Jd38JEH6YRgpZm7ubS_Ppq757r783Ros_UzqZ8A</recordid><startdate>199104</startdate><enddate>199104</enddate><creator>Tanaka, Isao</creator><creator>Pezzotti, Giuseppe</creator><creator>Matsushita, Ken-ichi</creator><creator>Miyamoto, Yoshinari</creator><creator>Okamoto, Taira</creator><general>Blackwell Publishing Ltd</general><general>Blackwell</general><scope>BSCLL</scope><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7SR</scope><scope>8FD</scope><scope>JG9</scope></search><sort><creationdate>199104</creationdate><title>Impurity-Enhanced Intergranular Cavity Formation in Silicon Nitride at High Temperatures</title><author>Tanaka, Isao ; Pezzotti, Giuseppe ; Matsushita, Ken-ichi ; Miyamoto, Yoshinari ; Okamoto, Taira</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c4842-99de5e0ab87f4c3173ee8288bd9bb23bddbd3b62cca334a53a0a6325a8e37b273</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>1991</creationdate><topic>Applied sciences</topic><topic>Building materials. Ceramics. Glasses</topic><topic>Ceramic industries</topic><topic>Chemical industry and chemicals</topic><topic>crack growth</topic><topic>Exact sciences and technology</topic><topic>friction</topic><topic>impurities</topic><topic>mechanical properties</topic><topic>silicon nitride</topic><topic>Structural ceramics</topic><topic>Technical ceramics</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Tanaka, Isao</creatorcontrib><creatorcontrib>Pezzotti, Giuseppe</creatorcontrib><creatorcontrib>Matsushita, Ken-ichi</creatorcontrib><creatorcontrib>Miyamoto, Yoshinari</creatorcontrib><creatorcontrib>Okamoto, Taira</creatorcontrib><collection>Istex</collection><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>Engineered Materials Abstracts</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><jtitle>Journal of the American Ceramic Society</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Tanaka, Isao</au><au>Pezzotti, Giuseppe</au><au>Matsushita, Ken-ichi</au><au>Miyamoto, Yoshinari</au><au>Okamoto, Taira</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Impurity-Enhanced Intergranular Cavity Formation in Silicon Nitride at High Temperatures</atitle><jtitle>Journal of the American Ceramic Society</jtitle><date>1991-04</date><risdate>1991</risdate><volume>74</volume><issue>4</issue><spage>752</spage><epage>759</epage><pages>752-759</pages><issn>0002-7820</issn><eissn>1551-2916</eissn><coden>JACTAW</coden><abstract>The effect of trace impurities on high‐temperature strength is examined in Si3N4 sintered without additives. Strength degradation above 1000°C occurs only in the low‐purity material, which also exhibits an intergranular slow crack growth (SCG) rate 2 orders of magnitude faster than that of the high‐purity material at 1400°C. A relaxation peak of internal friction is observed only in the low‐purity material, at ≅1200°C, and the origin of this peak is ascribed to the initial stage of SCG—that is, the cavity‐nucleation stage, enhanced by impurities. Based on the present results, a model for impurity‐enhanced SCG is proposed.</abstract><cop>Oxford, UK</cop><pub>Blackwell Publishing Ltd</pub><doi>10.1111/j.1151-2916.1991.tb06920.x</doi><tpages>8</tpages></addata></record> |
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subjects | Applied sciences Building materials. Ceramics. Glasses Ceramic industries Chemical industry and chemicals crack growth Exact sciences and technology friction impurities mechanical properties silicon nitride Structural ceramics Technical ceramics |
title | Impurity-Enhanced Intergranular Cavity Formation in Silicon Nitride at High Temperatures |
url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-05T15%3A36%3A24IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Impurity-Enhanced%20Intergranular%20Cavity%20Formation%20in%20Silicon%20Nitride%20at%20High%20Temperatures&rft.jtitle=Journal%20of%20the%20American%20Ceramic%20Society&rft.au=Tanaka,%20Isao&rft.date=1991-04&rft.volume=74&rft.issue=4&rft.spage=752&rft.epage=759&rft.pages=752-759&rft.issn=0002-7820&rft.eissn=1551-2916&rft.coden=JACTAW&rft_id=info:doi/10.1111/j.1151-2916.1991.tb06920.x&rft_dat=%3Cproquest_cross%3E25283834%3C/proquest_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=25283834&rft_id=info:pmid/&rfr_iscdi=true |