Impurity-Enhanced Intergranular Cavity Formation in Silicon Nitride at High Temperatures
The effect of trace impurities on high‐temperature strength is examined in Si3N4 sintered without additives. Strength degradation above 1000°C occurs only in the low‐purity material, which also exhibits an intergranular slow crack growth (SCG) rate 2 orders of magnitude faster than that of the high‐...
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Veröffentlicht in: | Journal of the American Ceramic Society 1991-04, Vol.74 (4), p.752-759 |
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Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | The effect of trace impurities on high‐temperature strength is examined in Si3N4 sintered without additives. Strength degradation above 1000°C occurs only in the low‐purity material, which also exhibits an intergranular slow crack growth (SCG) rate 2 orders of magnitude faster than that of the high‐purity material at 1400°C. A relaxation peak of internal friction is observed only in the low‐purity material, at ≅1200°C, and the origin of this peak is ascribed to the initial stage of SCG—that is, the cavity‐nucleation stage, enhanced by impurities. Based on the present results, a model for impurity‐enhanced SCG is proposed. |
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ISSN: | 0002-7820 1551-2916 |
DOI: | 10.1111/j.1151-2916.1991.tb06920.x |