Impurity-Enhanced Intergranular Cavity Formation in Silicon Nitride at High Temperatures

The effect of trace impurities on high‐temperature strength is examined in Si3N4 sintered without additives. Strength degradation above 1000°C occurs only in the low‐purity material, which also exhibits an intergranular slow crack growth (SCG) rate 2 orders of magnitude faster than that of the high‐...

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Veröffentlicht in:Journal of the American Ceramic Society 1991-04, Vol.74 (4), p.752-759
Hauptverfasser: Tanaka, Isao, Pezzotti, Giuseppe, Matsushita, Ken-ichi, Miyamoto, Yoshinari, Okamoto, Taira
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Sprache:eng
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Zusammenfassung:The effect of trace impurities on high‐temperature strength is examined in Si3N4 sintered without additives. Strength degradation above 1000°C occurs only in the low‐purity material, which also exhibits an intergranular slow crack growth (SCG) rate 2 orders of magnitude faster than that of the high‐purity material at 1400°C. A relaxation peak of internal friction is observed only in the low‐purity material, at ≅1200°C, and the origin of this peak is ascribed to the initial stage of SCG—that is, the cavity‐nucleation stage, enhanced by impurities. Based on the present results, a model for impurity‐enhanced SCG is proposed.
ISSN:0002-7820
1551-2916
DOI:10.1111/j.1151-2916.1991.tb06920.x