Fabrication of variable-thickness bridge using YBCO thin film

In-situ -grown YBCO thin films were prepared on a MgO substrate by rf magnetron sputtering with a dc-biased substrate holder using a stoichiometric Y 1 Ba 2 Cu 3 O y target. The variable-thickness bridges with the bridge length of 80 nm-200 nm were fabricated in these films by means of photolithography and slant evaporation techniques. The current-voltage characteristics of the bridge in rf radiation show the structure of the rf-induced steps over a wide temperature range.