X-ray microfluorescence analyzer for multilayer metal films

An X-ray microfluorescence analyzer is described which combines the nondestructive analytical method of X-ray fluorescence with relatively small spatial discrimination (less than 50 μm) such that composition (chemistry), thickness and microstructural measurements can be made on a wide variety of heterogeneous materials in a few seconds. By scanning samples with an X-Y stage, quantitative or qualitative microstructural information can be gathered. Quantitative analyses, obtained using fundamental parameter thin film software, are presented for selenium films on aluminum substrates, superconductor films on magnesium oxide, and silver on nickel on a copper substrate. In addition, qualitative line scan profiles are shown for a superconductor sample. Some results are compared with other analytical techniques, such electron probe microanalysis, and show similar analytical accuracies without the need for special sample preparation or destructive analysis.