The mechanism of corrosion inhibition of copper in NaCl solution by benzotriazole studied by electron spectroscopy

Surface films formed by benzotriazole on copper in 3% brine solution were investigated using X-ray photoelectron spectroscopy (XPS or ESCA) and X-ray induced Auger spectroscopy (X-AES). This combination proved to be quite useful for such studies. Based on the results obtained, a model for the inhibi...

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Veröffentlicht in:Electrochimica acta 1988-08, Vol.33 (8), p.1123-1127
Hauptverfasser: Hashemi, T., Hogarth, C.A.
Format: Artikel
Sprache:eng
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Zusammenfassung:Surface films formed by benzotriazole on copper in 3% brine solution were investigated using X-ray photoelectron spectroscopy (XPS or ESCA) and X-ray induced Auger spectroscopy (X-AES). This combination proved to be quite useful for such studies. Based on the results obtained, a model for the inhibition mechanism is proposed. According to this model, disproportionation of the Cu(I) ions followed by formation of a CuCl layer constitutes a suitable base for Cu—inhibitor complex formation. The thickness of the final complex layer is mainly governed by an intermediate stage of CuCl formation.
ISSN:0013-4686
1873-3859
DOI:10.1016/0013-4686(88)80203-2