The orientation and morphology of niobium deposits on Ni{111} substrates

Transmission electron microscopy and electron diffraction were applied to study vacuum-deposited Nb/Ni{111} bilayer films. The thicknesses of the niobium deposits and the substrate temperatures were in the ranges 1.5–10 nm and 25–300°C respectively. Depending on substrate temperature, the theoretica...

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Veröffentlicht in:	Thin solid films 1990-05, Vol.187 (1), p.111-119
Hauptverfasser:	Gaigher, H.L., van der Berg, N.G.
Format:	Artikel
Sprache:	eng
Schlagworte:	Analysing. Testing. Standards Applied sciences Condensed matter: structure, mechanical and thermal properties Cross-disciplinary physics: materials science rheology Exact sciences and technology Materials science Measurement of properties and materials state Metals, semimetals and alloys Metals. Metallurgy Nondestructive testing Physical properties of thin films, nonelectronic Physics Solid surfaces and solid-solid interfaces Specific materials Surface energy thermodynamic properties Surfaces and interfaces thin films and whiskers (structure and nonelectronic properties)
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Beschreibung
Zusammenfassung:	Transmission electron microscopy and electron diffraction were applied to study vacuum-deposited Nb/Ni{111} bilayer films. The thicknesses of the niobium deposits and the substrate temperatures were in the ranges 1.5–10 nm and 25–300°C respectively. Depending on substrate temperature, the theoretically predicted Nishiyama-Wassermann (NW) orientation, orientations with an azimuthal rotation of 30° with respect to NW, and a parallel orientation (Nb(111) 〈 110〉 ∥ Ni(111)〈 110〉) were observed. In addition an NbNi compound (θ phase) was identified. The deposits appeared continuous for all thickness and substrate temperatures.
ISSN:	0040-6090 1879-2731
DOI:	10.1016/0040-6090(90)90114-S