High-power, very low threshold, GaInP/AlGaInP visible diode lasers

Visible light (665 nm) laser diodes employing a strained-layer, single quantum well, graded index separate confinement heterostructure were fabricated from epitaxial wafers grown by metalorganic chemical vapor deposition. Threshold current densities for single element, uncoated, broad-area diodes op...

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Veröffentlicht in:Applied physics letters 1991-06, Vol.58 (22), p.2464-2466
Hauptverfasser: SERREZE, H. B, CHEN, Y. C, WATERS, R. G
Format: Artikel
Sprache:eng
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Zusammenfassung:Visible light (665 nm) laser diodes employing a strained-layer, single quantum well, graded index separate confinement heterostructure were fabricated from epitaxial wafers grown by metalorganic chemical vapor deposition. Threshold current densities for single element, uncoated, broad-area diodes operated cw as low as 425 A/cm2, cw power outputs of 340 mW per facet, and pulsed outputs (100 μs pulse width) of slightly under 1 W per facet were achieved. These power output values are believed to be the highest reported to date for visible light diode lasers, and this cw threshold current density is believed to be, by far, the lowest.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.104845