Pulse-doped AlGaAs/InGaAs pseudomorphic MODFETs

MODFETs have been fabricated using heterojunctions consisting of AlGaAs and pseudomorphic InGaAs, grown on GaAs substrates. The large conduction band discontinuity (about 0.46 eV for 25% In and Al concentration) leads to a 2-D electron density as high as 2.3*10/sup 12/ cm/sup -2/, with electron mobi...

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Veröffentlicht in:IEEE transactions on electron devices 1988-07, Vol.35 (7), p.879-886
Hauptverfasser: Moll, N., Hueschen, M.R., Fischer-Colbrie, A.
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Hueschen, M.R.
Fischer-Colbrie, A.
description MODFETs have been fabricated using heterojunctions consisting of AlGaAs and pseudomorphic InGaAs, grown on GaAs substrates. The large conduction band discontinuity (about 0.46 eV for 25% In and Al concentration) leads to a 2-D electron density as high as 2.3*10/sup 12/ cm/sup -2/, with electron mobilities of 7000 and 16000 cm/sup 2//V-s at 300 and 77 K, respectively. Such a high electron density in combination with reasonable transport properties leads to MODFETs with exceptional characteristics. Devices with 0.15-0.25- mu m gate length have room-temperature drain currents as high as 600 mA/mm and room-temperature transconductance as high as 500 mS/mm. The f/sub T/ is as high as 98 GHz, as determined by 20-dB/decade extrapolation of microwave data taken to 25 GHz. A comparison of the effect of bias on the total delay through standard and pseudomorphic MODFETs suggests that the excellent microwave performance exhibited by the pseudomorphic device arises from a reduction in parasitic and drain delays and not from a higher electron velocity under the gate.< >
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The large conduction band discontinuity (about 0.46 eV for 25% In and Al concentration) leads to a 2-D electron density as high as 2.3*10/sup 12/ cm/sup -2/, with electron mobilities of 7000 and 16000 cm/sup 2//V-s at 300 and 77 K, respectively. Such a high electron density in combination with reasonable transport properties leads to MODFETs with exceptional characteristics. Devices with 0.15-0.25- mu m gate length have room-temperature drain currents as high as 600 mA/mm and room-temperature transconductance as high as 500 mS/mm. The f/sub T/ is as high as 98 GHz, as determined by 20-dB/decade extrapolation of microwave data taken to 25 GHz. A comparison of the effect of bias on the total delay through standard and pseudomorphic MODFETs suggests that the excellent microwave performance exhibited by the pseudomorphic device arises from a reduction in parasitic and drain delays and not from a higher electron velocity under the gate.&lt; &gt;</description><subject>Applied sciences</subject><subject>Delay effects</subject><subject>Electron mobility</subject><subject>Electronics</subject><subject>Exact sciences and technology</subject><subject>Extrapolation</subject><subject>Gallium arsenide</subject><subject>HEMTs</subject><subject>Heterojunctions</subject><subject>Indium gallium arsenide</subject><subject>Microwave devices</subject><subject>MODFETs</subject><subject>Semiconductor electronics. Microelectronics. Optoelectronics. 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Solid state devices</topic><topic>Transconductance</topic><topic>Transistors</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Moll, N.</creatorcontrib><creatorcontrib>Hueschen, M.R.</creatorcontrib><creatorcontrib>Fischer-Colbrie, A.</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>Electronics &amp; Communications Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>Technology Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><collection>Aerospace Database</collection><jtitle>IEEE transactions on electron devices</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Moll, N.</au><au>Hueschen, M.R.</au><au>Fischer-Colbrie, A.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Pulse-doped AlGaAs/InGaAs pseudomorphic MODFETs</atitle><jtitle>IEEE transactions on electron devices</jtitle><stitle>TED</stitle><date>1988-07-01</date><risdate>1988</risdate><volume>35</volume><issue>7</issue><spage>879</spage><epage>886</epage><pages>879-886</pages><issn>0018-9383</issn><eissn>1557-9646</eissn><coden>IETDAI</coden><abstract>MODFETs have been fabricated using heterojunctions consisting of AlGaAs and pseudomorphic InGaAs, grown on GaAs substrates. The large conduction band discontinuity (about 0.46 eV for 25% In and Al concentration) leads to a 2-D electron density as high as 2.3*10/sup 12/ cm/sup -2/, with electron mobilities of 7000 and 16000 cm/sup 2//V-s at 300 and 77 K, respectively. Such a high electron density in combination with reasonable transport properties leads to MODFETs with exceptional characteristics. Devices with 0.15-0.25- mu m gate length have room-temperature drain currents as high as 600 mA/mm and room-temperature transconductance as high as 500 mS/mm. The f/sub T/ is as high as 98 GHz, as determined by 20-dB/decade extrapolation of microwave data taken to 25 GHz. A comparison of the effect of bias on the total delay through standard and pseudomorphic MODFETs suggests that the excellent microwave performance exhibited by the pseudomorphic device arises from a reduction in parasitic and drain delays and not from a higher electron velocity under the gate.&lt; &gt;</abstract><cop>New York, NY</cop><pub>IEEE</pub><doi>10.1109/16.3339</doi><tpages>8</tpages></addata></record>
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source IEEE Electronic Library (IEL)
subjects Applied sciences
Delay effects
Electron mobility
Electronics
Exact sciences and technology
Extrapolation
Gallium arsenide
HEMTs
Heterojunctions
Indium gallium arsenide
Microwave devices
MODFETs
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
Transconductance
Transistors
title Pulse-doped AlGaAs/InGaAs pseudomorphic MODFETs
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