Pulse-doped AlGaAs/InGaAs pseudomorphic MODFETs

MODFETs have been fabricated using heterojunctions consisting of AlGaAs and pseudomorphic InGaAs, grown on GaAs substrates. The large conduction band discontinuity (about 0.46 eV for 25% In and Al concentration) leads to a 2-D electron density as high as 2.3*10/sup 12/ cm/sup -2/, with electron mobi...

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Veröffentlicht in:IEEE transactions on electron devices 1988-07, Vol.35 (7), p.879-886
Hauptverfasser: Moll, N., Hueschen, M.R., Fischer-Colbrie, A.
Format: Artikel
Sprache:eng
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Zusammenfassung:MODFETs have been fabricated using heterojunctions consisting of AlGaAs and pseudomorphic InGaAs, grown on GaAs substrates. The large conduction band discontinuity (about 0.46 eV for 25% In and Al concentration) leads to a 2-D electron density as high as 2.3*10/sup 12/ cm/sup -2/, with electron mobilities of 7000 and 16000 cm/sup 2//V-s at 300 and 77 K, respectively. Such a high electron density in combination with reasonable transport properties leads to MODFETs with exceptional characteristics. Devices with 0.15-0.25- mu m gate length have room-temperature drain currents as high as 600 mA/mm and room-temperature transconductance as high as 500 mS/mm. The f/sub T/ is as high as 98 GHz, as determined by 20-dB/decade extrapolation of microwave data taken to 25 GHz. A comparison of the effect of bias on the total delay through standard and pseudomorphic MODFETs suggests that the excellent microwave performance exhibited by the pseudomorphic device arises from a reduction in parasitic and drain delays and not from a higher electron velocity under the gate.< >
ISSN:0018-9383
1557-9646
DOI:10.1109/16.3339