Laser Induced Photolytic Tin Deposition With High Deposition Rates for the Repair of Clear X-Ray Mask Defects
The laser induced photolytic deposition of Sn from tetramethyltin is a useful method for the repair of clear defects on X-ray masks because this process meets most of the specific demands on the X-ray mask technology. The principally low deposition rates of photolytic processes could be enhanced by...
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| Veröffentlicht in: | Microelectronic engineering 1988-09, Vol.9 (1-4), p.175-178 |
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| Hauptverfasser: | , , , |
| Format: | Artikel |
| Sprache: | eng |
| Online-Zugang: | Volltext |
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