Effect of sputtering parameters on the magnetic properties of Mo-Permalloy
Sputtered Mo-Permalloy thin film is expected to possess great potentiality in soft magnetic properties which can be realized chiefly by controlling sputtering conditions. The effects of sputtering parameters, such as argon pressure, bias voltage, and preheating temperature, on the magnetic propertie...
Gespeichert in:
| Veröffentlicht in: | J. Appl. Phys.; (United States) 1988-11, Vol.64 (10), p.5670-5672 |
|---|---|
| Hauptverfasser: | , , , |
| Format: | Artikel |
| Sprache: | eng |
| Schlagworte: | |
| Online-Zugang: | Volltext |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | 5672 |
|---|---|
| container_issue | 10 |
| container_start_page | 5670 |
| container_title | J. Appl. Phys.; (United States) |
| container_volume | 64 |
| creator | ZHANG, Z. S YANG, L YANG, C. S CAI, B. C |
| description | Sputtered Mo-Permalloy thin film is expected to possess great potentiality in soft magnetic properties which can be realized chiefly by controlling sputtering conditions. The effects of sputtering parameters, such as argon pressure, bias voltage, and preheating temperature, on the magnetic properties, of FeNiMo sputtered films have been investigated. The magnetic anisotropy field Hk was found to decrease with the raising preheating temperature while coercivity Hc presented the contrary trend. High effective permeability can be acquired at low argon pressure, adequate preheating temperature, and bias voltage. Close relationships among effective permeability, anisotropy field, magnetostriction coefficient, and half-height width Δθ50 were found. Annealing is available for increasing effective permeability. |
| doi_str_mv | 10.1063/1.342269 |
| format | Article |
| fullrecord | <record><control><sourceid>proquest_osti_</sourceid><recordid>TN_cdi_proquest_miscellaneous_24873731</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>24873731</sourcerecordid><originalsourceid>FETCH-LOGICAL-c314t-666f8a09500ae5e5feb7a0cc291ef0c685bfeb351bdbe2f9f9c68105b0fbad623</originalsourceid><addsrcrecordid>eNo9kE9LAzEQxYMoWKvgR1hExMvWyabZTY5S6j8qetBzyKaTNrK7WZP00G_vli2ehnn85jHvEXJNYUahZA90xuZFUcoTMqEgZF5xDqdkAlDQXMhKnpOLGH8AKBVMTsjb0lo0KfM2i_0uJQyu22S9DrrFYYmZ77K0xazVmw6TM1kffI8hOYyHm3eff2JoddP4_SU5s7qJeHWcU_L9tPxavOSrj-fXxeMqN4zOU16WpRUaJAfQyJFbrCsNxhSSogVTCl4PEuO0XtdYWGnloFHgNdhar8uCTcnN6Otjcioal9Bsje-6IYcqq0IITgfoboSGf393GJNqXTTYNLpDv4uqmIuKVewA3o-gCT7GgFb1wbU67BUFdWhUUTU2OqC3R08djW5s0J1x8Z-vQDAxtPoHzlR1Jw</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>24873731</pqid></control><display><type>article</type><title>Effect of sputtering parameters on the magnetic properties of Mo-Permalloy</title><source>AIP Digital Archive</source><creator>ZHANG, Z. S ; YANG, L ; YANG, C. S ; CAI, B. C</creator><creatorcontrib>ZHANG, Z. S ; YANG, L ; YANG, C. S ; CAI, B. C ; Department of Materials Science and Engineering, Shanghai Jiao Tong University, Shanghai, People's Republic of China</creatorcontrib><description>Sputtered Mo-Permalloy thin film is expected to possess great potentiality in soft magnetic properties which can be realized chiefly by controlling sputtering conditions. The effects of sputtering parameters, such as argon pressure, bias voltage, and preheating temperature, on the magnetic properties, of FeNiMo sputtered films have been investigated. The magnetic anisotropy field Hk was found to decrease with the raising preheating temperature while coercivity Hc presented the contrary trend. High effective permeability can be acquired at low argon pressure, adequate preheating temperature, and bias voltage. Close relationships among effective permeability, anisotropy field, magnetostriction coefficient, and half-height width Δθ50 were found. Annealing is available for increasing effective permeability.</description><identifier>ISSN: 0021-8979</identifier><identifier>EISSN: 1089-7550</identifier><identifier>DOI: 10.1063/1.342269</identifier><identifier>CODEN: JAPIAU</identifier><language>eng</language><publisher>Woodbury, NY: American Institute of Physics</publisher><subject>ALLOYS ; Analysing. Testing. Standards ; ANNEALING ; Applied sciences ; ARGON ; Condensed matter: electronic structure, electrical, magnetic, and optical properties ; Cross-disciplinary physics: materials science; rheology ; ELEMENTS ; Exact sciences and technology ; FLUIDS ; GASES ; HEAT TREATMENTS ; IRON ALLOYS ; MAGNETIC PROPERTIES ; Magnetic properties and materials ; Magnetic properties of surface, thin films and multilayers ; MAGNETIC SUSCEPTIBILITY ; MATERIALS SCIENCE ; Measurement of properties and materials state ; Metals, semimetals and alloys ; Metals. Metallurgy ; MOLYBDENUM ALLOYS ; NICKEL ALLOYS ; Nondestructive testing ; NONMETALS ; PERMALLOY ; PHYSICAL PROPERTIES ; Physics ; PRESSURE DEPENDENCE ; RARE GASES 360104 -- Metals & Alloys-- Physical Properties ; Specific materials ; SPUTTERING ; THIN FILMS</subject><ispartof>J. Appl. Phys.; (United States), 1988-11, Vol.64 (10), p.5670-5672</ispartof><rights>1989 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c314t-666f8a09500ae5e5feb7a0cc291ef0c685bfeb351bdbe2f9f9c68105b0fbad623</citedby><cites>FETCH-LOGICAL-c314t-666f8a09500ae5e5feb7a0cc291ef0c685bfeb351bdbe2f9f9c68105b0fbad623</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>309,310,314,776,780,785,786,881,23910,23911,25119,27903,27904</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=7083818$$DView record in Pascal Francis$$Hfree_for_read</backlink><backlink>$$Uhttps://www.osti.gov/biblio/6728851$$D View this record in Osti.gov$$Hfree_for_read</backlink></links><search><creatorcontrib>ZHANG, Z. S</creatorcontrib><creatorcontrib>YANG, L</creatorcontrib><creatorcontrib>YANG, C. S</creatorcontrib><creatorcontrib>CAI, B. C</creatorcontrib><creatorcontrib>Department of Materials Science and Engineering, Shanghai Jiao Tong University, Shanghai, People's Republic of China</creatorcontrib><title>Effect of sputtering parameters on the magnetic properties of Mo-Permalloy</title><title>J. Appl. Phys.; (United States)</title><description>Sputtered Mo-Permalloy thin film is expected to possess great potentiality in soft magnetic properties which can be realized chiefly by controlling sputtering conditions. The effects of sputtering parameters, such as argon pressure, bias voltage, and preheating temperature, on the magnetic properties, of FeNiMo sputtered films have been investigated. The magnetic anisotropy field Hk was found to decrease with the raising preheating temperature while coercivity Hc presented the contrary trend. High effective permeability can be acquired at low argon pressure, adequate preheating temperature, and bias voltage. Close relationships among effective permeability, anisotropy field, magnetostriction coefficient, and half-height width Δθ50 were found. Annealing is available for increasing effective permeability.</description><subject>ALLOYS</subject><subject>Analysing. Testing. Standards</subject><subject>ANNEALING</subject><subject>Applied sciences</subject><subject>ARGON</subject><subject>Condensed matter: electronic structure, electrical, magnetic, and optical properties</subject><subject>Cross-disciplinary physics: materials science; rheology</subject><subject>ELEMENTS</subject><subject>Exact sciences and technology</subject><subject>FLUIDS</subject><subject>GASES</subject><subject>HEAT TREATMENTS</subject><subject>IRON ALLOYS</subject><subject>MAGNETIC PROPERTIES</subject><subject>Magnetic properties and materials</subject><subject>Magnetic properties of surface, thin films and multilayers</subject><subject>MAGNETIC SUSCEPTIBILITY</subject><subject>MATERIALS SCIENCE</subject><subject>Measurement of properties and materials state</subject><subject>Metals, semimetals and alloys</subject><subject>Metals. Metallurgy</subject><subject>MOLYBDENUM ALLOYS</subject><subject>NICKEL ALLOYS</subject><subject>Nondestructive testing</subject><subject>NONMETALS</subject><subject>PERMALLOY</subject><subject>PHYSICAL PROPERTIES</subject><subject>Physics</subject><subject>PRESSURE DEPENDENCE</subject><subject>RARE GASES 360104 -- Metals & Alloys-- Physical Properties</subject><subject>Specific materials</subject><subject>SPUTTERING</subject><subject>THIN FILMS</subject><issn>0021-8979</issn><issn>1089-7550</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>1988</creationdate><recordtype>article</recordtype><recordid>eNo9kE9LAzEQxYMoWKvgR1hExMvWyabZTY5S6j8qetBzyKaTNrK7WZP00G_vli2ehnn85jHvEXJNYUahZA90xuZFUcoTMqEgZF5xDqdkAlDQXMhKnpOLGH8AKBVMTsjb0lo0KfM2i_0uJQyu22S9DrrFYYmZ77K0xazVmw6TM1kffI8hOYyHm3eff2JoddP4_SU5s7qJeHWcU_L9tPxavOSrj-fXxeMqN4zOU16WpRUaJAfQyJFbrCsNxhSSogVTCl4PEuO0XtdYWGnloFHgNdhar8uCTcnN6Otjcioal9Bsje-6IYcqq0IITgfoboSGf393GJNqXTTYNLpDv4uqmIuKVewA3o-gCT7GgFb1wbU67BUFdWhUUTU2OqC3R08djW5s0J1x8Z-vQDAxtPoHzlR1Jw</recordid><startdate>19881115</startdate><enddate>19881115</enddate><creator>ZHANG, Z. S</creator><creator>YANG, L</creator><creator>YANG, C. S</creator><creator>CAI, B. C</creator><general>American Institute of Physics</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7U5</scope><scope>8FD</scope><scope>L7M</scope><scope>OTOTI</scope></search><sort><creationdate>19881115</creationdate><title>Effect of sputtering parameters on the magnetic properties of Mo-Permalloy</title><author>ZHANG, Z. S ; YANG, L ; YANG, C. S ; CAI, B. C</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c314t-666f8a09500ae5e5feb7a0cc291ef0c685bfeb351bdbe2f9f9c68105b0fbad623</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>1988</creationdate><topic>ALLOYS</topic><topic>Analysing. Testing. Standards</topic><topic>ANNEALING</topic><topic>Applied sciences</topic><topic>ARGON</topic><topic>Condensed matter: electronic structure, electrical, magnetic, and optical properties</topic><topic>Cross-disciplinary physics: materials science; rheology</topic><topic>ELEMENTS</topic><topic>Exact sciences and technology</topic><topic>FLUIDS</topic><topic>GASES</topic><topic>HEAT TREATMENTS</topic><topic>IRON ALLOYS</topic><topic>MAGNETIC PROPERTIES</topic><topic>Magnetic properties and materials</topic><topic>Magnetic properties of surface, thin films and multilayers</topic><topic>MAGNETIC SUSCEPTIBILITY</topic><topic>MATERIALS SCIENCE</topic><topic>Measurement of properties and materials state</topic><topic>Metals, semimetals and alloys</topic><topic>Metals. Metallurgy</topic><topic>MOLYBDENUM ALLOYS</topic><topic>NICKEL ALLOYS</topic><topic>Nondestructive testing</topic><topic>NONMETALS</topic><topic>PERMALLOY</topic><topic>PHYSICAL PROPERTIES</topic><topic>Physics</topic><topic>PRESSURE DEPENDENCE</topic><topic>RARE GASES 360104 -- Metals & Alloys-- Physical Properties</topic><topic>Specific materials</topic><topic>SPUTTERING</topic><topic>THIN FILMS</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>ZHANG, Z. S</creatorcontrib><creatorcontrib>YANG, L</creatorcontrib><creatorcontrib>YANG, C. S</creatorcontrib><creatorcontrib>CAI, B. C</creatorcontrib><creatorcontrib>Department of Materials Science and Engineering, Shanghai Jiao Tong University, Shanghai, People's Republic of China</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>Technology Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><collection>OSTI.GOV</collection><jtitle>J. Appl. Phys.; (United States)</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>ZHANG, Z. S</au><au>YANG, L</au><au>YANG, C. S</au><au>CAI, B. C</au><aucorp>Department of Materials Science and Engineering, Shanghai Jiao Tong University, Shanghai, People's Republic of China</aucorp><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Effect of sputtering parameters on the magnetic properties of Mo-Permalloy</atitle><jtitle>J. Appl. Phys.; (United States)</jtitle><date>1988-11-15</date><risdate>1988</risdate><volume>64</volume><issue>10</issue><spage>5670</spage><epage>5672</epage><pages>5670-5672</pages><issn>0021-8979</issn><eissn>1089-7550</eissn><coden>JAPIAU</coden><abstract>Sputtered Mo-Permalloy thin film is expected to possess great potentiality in soft magnetic properties which can be realized chiefly by controlling sputtering conditions. The effects of sputtering parameters, such as argon pressure, bias voltage, and preheating temperature, on the magnetic properties, of FeNiMo sputtered films have been investigated. The magnetic anisotropy field Hk was found to decrease with the raising preheating temperature while coercivity Hc presented the contrary trend. High effective permeability can be acquired at low argon pressure, adequate preheating temperature, and bias voltage. Close relationships among effective permeability, anisotropy field, magnetostriction coefficient, and half-height width Δθ50 were found. Annealing is available for increasing effective permeability.</abstract><cop>Woodbury, NY</cop><pub>American Institute of Physics</pub><doi>10.1063/1.342269</doi><tpages>3</tpages></addata></record> |
| fulltext | fulltext |
| identifier | ISSN: 0021-8979 |
| ispartof | J. Appl. Phys.; (United States), 1988-11, Vol.64 (10), p.5670-5672 |
| issn | 0021-8979 1089-7550 |
| language | eng |
| recordid | cdi_proquest_miscellaneous_24873731 |
| source | AIP Digital Archive |
| subjects | ALLOYS Analysing. Testing. Standards ANNEALING Applied sciences ARGON Condensed matter: electronic structure, electrical, magnetic, and optical properties Cross-disciplinary physics: materials science rheology ELEMENTS Exact sciences and technology FLUIDS GASES HEAT TREATMENTS IRON ALLOYS MAGNETIC PROPERTIES Magnetic properties and materials Magnetic properties of surface, thin films and multilayers MAGNETIC SUSCEPTIBILITY MATERIALS SCIENCE Measurement of properties and materials state Metals, semimetals and alloys Metals. Metallurgy MOLYBDENUM ALLOYS NICKEL ALLOYS Nondestructive testing NONMETALS PERMALLOY PHYSICAL PROPERTIES Physics PRESSURE DEPENDENCE RARE GASES 360104 -- Metals & Alloys-- Physical Properties Specific materials SPUTTERING THIN FILMS |
| title | Effect of sputtering parameters on the magnetic properties of Mo-Permalloy |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-21T19%3A05%3A08IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_osti_&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Effect%20of%20sputtering%20parameters%20on%20the%20magnetic%20properties%20of%20Mo-Permalloy&rft.jtitle=J.%20Appl.%20Phys.;%20(United%20States)&rft.au=ZHANG,%20Z.%20S&rft.aucorp=Department%20of%20Materials%20Science%20and%20Engineering,%20Shanghai%20Jiao%20Tong%20University,%20Shanghai,%20People's%20Republic%20of%20China&rft.date=1988-11-15&rft.volume=64&rft.issue=10&rft.spage=5670&rft.epage=5672&rft.pages=5670-5672&rft.issn=0021-8979&rft.eissn=1089-7550&rft.coden=JAPIAU&rft_id=info:doi/10.1063/1.342269&rft_dat=%3Cproquest_osti_%3E24873731%3C/proquest_osti_%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=24873731&rft_id=info:pmid/&rfr_iscdi=true |