Effect of sputtering parameters on the magnetic properties of Mo-Permalloy

Sputtered Mo-Permalloy thin film is expected to possess great potentiality in soft magnetic properties which can be realized chiefly by controlling sputtering conditions. The effects of sputtering parameters, such as argon pressure, bias voltage, and preheating temperature, on the magnetic properties, of FeNiMo sputtered films have been investigated. The magnetic anisotropy field Hk was found to decrease with the raising preheating temperature while coercivity Hc presented the contrary trend. High effective permeability can be acquired at low argon pressure, adequate preheating temperature, and bias voltage. Close relationships among effective permeability, anisotropy field, magnetostriction coefficient, and half-height width Δθ50 were found. Annealing is available for increasing effective permeability.