Strong metal-support interaction in the system of platinum on quartz glass in a reducing atmosphere
The formation of platinum silicide(s) on heating Pt/SiO sub 2 at 823K in H sub 2 at 10 exp --2 -10 exp --3 Pa is experimentally confirmed. The particle size parameters of the Pt film on the SiO sub 2 glass substrate after the treatment are given with accompanying electron micrographs. Electron diffr...
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| Veröffentlicht in: | Thin solid films 1985-06, Vol.128 (1), p.L29-L32 |
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| container_end_page | L32 |
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| container_title | Thin solid films |
| container_volume | 128 |
| creator | Lamber, Ryszard |
| description | The formation of platinum silicide(s) on heating Pt/SiO sub 2 at 823K in H sub 2 at 10 exp --2 -10 exp --3 Pa is experimentally confirmed. The particle size parameters of the Pt film on the SiO sub 2 glass substrate after the treatment are given with accompanying electron micrographs. Electron diffraction rings provide direct evidence of the interaction between Pt and SiO sub 2 , attributed to Pt sub 2 Si and Pt sub 3 Si. It is postulated that the reduction involves atomic hydrogen, the adsorption of which is facilitated by the porous nature of the SiO sub 2 surface. 6 ref.--G.A.S. |
| doi_str_mv | 10.1016/0040-6090(85)90346-3 |
| format | Article |
| fullrecord | <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_miscellaneous_24811952</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><els_id>0040609085903463</els_id><sourcerecordid>24811952</sourcerecordid><originalsourceid>FETCH-LOGICAL-c430t-15249db5362a57f701f0eed70ead1cf4fab8519d86d44ecad7a4487f778189593</originalsourceid><addsrcrecordid>eNp9kMFu1TAQRa2KSjza_gELLxCCRWCcOIm9QUIVBaRKLKBra2pPWldJnHqcSuXryeurumQ1szj3juYI8VbBJwWq-wygoerAwgfTfrTQ6K5qjsROmd5Wdd-oV2L3grwWb5jvAEDVdbMT_nfJab6RExUcK16XJeUi41wooy8xzdsuyy1JfuRCk0yDXEYscV63fZb3K-byV96MyLwnUWYKq49bI5Yp8XJLmU7F8YAj09nzPBFXF9_-nP-oLn99_3n-9bLyuoFSqbbWNly3TVdj2w89qAGIQg-EQflBD3htWmWD6YLW5DH0qLXZwN4oY1vbnIj3h94lp_uVuLgpsqdxxJnSyq7WRinb1huoD6DPiTnT4JYcJ8yPToHbG3V7XW6vy5nWPRl1zRZ799yP7HEcMs4-8kvW9NBZMBv25YDR9utDpOzYR5o9hZjJFxdS_P-df9s8ixc</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>24811952</pqid></control><display><type>article</type><title>Strong metal-support interaction in the system of platinum on quartz glass in a reducing atmosphere</title><source>Elsevier ScienceDirect Journals Complete</source><creator>Lamber, Ryszard</creator><creatorcontrib>Lamber, Ryszard</creatorcontrib><description>The formation of platinum silicide(s) on heating Pt/SiO sub 2 at 823K in H sub 2 at 10 exp --2 -10 exp --3 Pa is experimentally confirmed. The particle size parameters of the Pt film on the SiO sub 2 glass substrate after the treatment are given with accompanying electron micrographs. Electron diffraction rings provide direct evidence of the interaction between Pt and SiO sub 2 , attributed to Pt sub 2 Si and Pt sub 3 Si. It is postulated that the reduction involves atomic hydrogen, the adsorption of which is facilitated by the porous nature of the SiO sub 2 surface. 6 ref.--G.A.S.</description><identifier>ISSN: 0040-6090</identifier><identifier>EISSN: 1879-2731</identifier><identifier>DOI: 10.1016/0040-6090(85)90346-3</identifier><identifier>CODEN: THSFAP</identifier><language>eng</language><publisher>Lausanne: Elsevier B.V</publisher><subject>Applied sciences ; Condensed matter: structure, mechanical and thermal properties ; Cross-disciplinary physics: materials science; rheology ; Exact sciences and technology ; Materials science ; Metals, semimetals and alloys ; Metals. Metallurgy ; Other nonelectronic physical properties ; Physical properties of thin films, nonelectronic ; Physics ; Solid surfaces and solid-solid interfaces ; Specific materials ; Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties)</subject><ispartof>Thin solid films, 1985-06, Vol.128 (1), p.L29-L32</ispartof><rights>1985</rights><rights>1986 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c430t-15249db5362a57f701f0eed70ead1cf4fab8519d86d44ecad7a4487f778189593</citedby><cites>FETCH-LOGICAL-c430t-15249db5362a57f701f0eed70ead1cf4fab8519d86d44ecad7a4487f778189593</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://dx.doi.org/10.1016/0040-6090(85)90346-3$$EHTML$$P50$$Gelsevier$$H</linktohtml><link.rule.ids>314,780,784,3550,27924,27925,45995</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=8706908$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>Lamber, Ryszard</creatorcontrib><title>Strong metal-support interaction in the system of platinum on quartz glass in a reducing atmosphere</title><title>Thin solid films</title><description>The formation of platinum silicide(s) on heating Pt/SiO sub 2 at 823K in H sub 2 at 10 exp --2 -10 exp --3 Pa is experimentally confirmed. The particle size parameters of the Pt film on the SiO sub 2 glass substrate after the treatment are given with accompanying electron micrographs. Electron diffraction rings provide direct evidence of the interaction between Pt and SiO sub 2 , attributed to Pt sub 2 Si and Pt sub 3 Si. It is postulated that the reduction involves atomic hydrogen, the adsorption of which is facilitated by the porous nature of the SiO sub 2 surface. 6 ref.--G.A.S.</description><subject>Applied sciences</subject><subject>Condensed matter: structure, mechanical and thermal properties</subject><subject>Cross-disciplinary physics: materials science; rheology</subject><subject>Exact sciences and technology</subject><subject>Materials science</subject><subject>Metals, semimetals and alloys</subject><subject>Metals. Metallurgy</subject><subject>Other nonelectronic physical properties</subject><subject>Physical properties of thin films, nonelectronic</subject><subject>Physics</subject><subject>Solid surfaces and solid-solid interfaces</subject><subject>Specific materials</subject><subject>Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties)</subject><issn>0040-6090</issn><issn>1879-2731</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>1985</creationdate><recordtype>article</recordtype><recordid>eNp9kMFu1TAQRa2KSjza_gELLxCCRWCcOIm9QUIVBaRKLKBra2pPWldJnHqcSuXryeurumQ1szj3juYI8VbBJwWq-wygoerAwgfTfrTQ6K5qjsROmd5Wdd-oV2L3grwWb5jvAEDVdbMT_nfJab6RExUcK16XJeUi41wooy8xzdsuyy1JfuRCk0yDXEYscV63fZb3K-byV96MyLwnUWYKq49bI5Yp8XJLmU7F8YAj09nzPBFXF9_-nP-oLn99_3n-9bLyuoFSqbbWNly3TVdj2w89qAGIQg-EQflBD3htWmWD6YLW5DH0qLXZwN4oY1vbnIj3h94lp_uVuLgpsqdxxJnSyq7WRinb1huoD6DPiTnT4JYcJ8yPToHbG3V7XW6vy5nWPRl1zRZ799yP7HEcMs4-8kvW9NBZMBv25YDR9utDpOzYR5o9hZjJFxdS_P-df9s8ixc</recordid><startdate>19850614</startdate><enddate>19850614</enddate><creator>Lamber, Ryszard</creator><general>Elsevier B.V</general><general>Elsevier Science</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>8BQ</scope><scope>8FD</scope><scope>JG9</scope></search><sort><creationdate>19850614</creationdate><title>Strong metal-support interaction in the system of platinum on quartz glass in a reducing atmosphere</title><author>Lamber, Ryszard</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c430t-15249db5362a57f701f0eed70ead1cf4fab8519d86d44ecad7a4487f778189593</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>1985</creationdate><topic>Applied sciences</topic><topic>Condensed matter: structure, mechanical and thermal properties</topic><topic>Cross-disciplinary physics: materials science; rheology</topic><topic>Exact sciences and technology</topic><topic>Materials science</topic><topic>Metals, semimetals and alloys</topic><topic>Metals. Metallurgy</topic><topic>Other nonelectronic physical properties</topic><topic>Physical properties of thin films, nonelectronic</topic><topic>Physics</topic><topic>Solid surfaces and solid-solid interfaces</topic><topic>Specific materials</topic><topic>Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties)</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Lamber, Ryszard</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><jtitle>Thin solid films</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Lamber, Ryszard</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Strong metal-support interaction in the system of platinum on quartz glass in a reducing atmosphere</atitle><jtitle>Thin solid films</jtitle><date>1985-06-14</date><risdate>1985</risdate><volume>128</volume><issue>1</issue><spage>L29</spage><epage>L32</epage><pages>L29-L32</pages><issn>0040-6090</issn><eissn>1879-2731</eissn><coden>THSFAP</coden><abstract>The formation of platinum silicide(s) on heating Pt/SiO sub 2 at 823K in H sub 2 at 10 exp --2 -10 exp --3 Pa is experimentally confirmed. The particle size parameters of the Pt film on the SiO sub 2 glass substrate after the treatment are given with accompanying electron micrographs. Electron diffraction rings provide direct evidence of the interaction between Pt and SiO sub 2 , attributed to Pt sub 2 Si and Pt sub 3 Si. It is postulated that the reduction involves atomic hydrogen, the adsorption of which is facilitated by the porous nature of the SiO sub 2 surface. 6 ref.--G.A.S.</abstract><cop>Lausanne</cop><pub>Elsevier B.V</pub><doi>10.1016/0040-6090(85)90346-3</doi></addata></record> |
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| language | eng |
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| source | Elsevier ScienceDirect Journals Complete |
| subjects | Applied sciences Condensed matter: structure, mechanical and thermal properties Cross-disciplinary physics: materials science rheology Exact sciences and technology Materials science Metals, semimetals and alloys Metals. Metallurgy Other nonelectronic physical properties Physical properties of thin films, nonelectronic Physics Solid surfaces and solid-solid interfaces Specific materials Surfaces and interfaces thin films and whiskers (structure and nonelectronic properties) |
| title | Strong metal-support interaction in the system of platinum on quartz glass in a reducing atmosphere |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-26T02%3A04%3A38IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Strong%20metal-support%20interaction%20in%20the%20system%20of%20platinum%20on%20quartz%20glass%20in%20a%20reducing%20atmosphere&rft.jtitle=Thin%20solid%20films&rft.au=Lamber,%20Ryszard&rft.date=1985-06-14&rft.volume=128&rft.issue=1&rft.spage=L29&rft.epage=L32&rft.pages=L29-L32&rft.issn=0040-6090&rft.eissn=1879-2731&rft.coden=THSFAP&rft_id=info:doi/10.1016/0040-6090(85)90346-3&rft_dat=%3Cproquest_cross%3E24811952%3C/proquest_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=24811952&rft_id=info:pmid/&rft_els_id=0040609085903463&rfr_iscdi=true |