Strong metal-support interaction in the system of platinum on quartz glass in a reducing atmosphere
The formation of platinum silicide(s) on heating Pt/SiO sub 2 at 823K in H sub 2 at 10 exp --2 -10 exp --3 Pa is experimentally confirmed. The particle size parameters of the Pt film on the SiO sub 2 glass substrate after the treatment are given with accompanying electron micrographs. Electron diffr...
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Veröffentlicht in: | Thin solid films 1985-06, Vol.128 (1), p.L29-L32 |
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Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | The formation of platinum silicide(s) on heating Pt/SiO sub 2 at 823K in H sub 2 at 10 exp --2 -10 exp --3 Pa is experimentally confirmed. The particle size parameters of the Pt film on the SiO sub 2 glass substrate after the treatment are given with accompanying electron micrographs. Electron diffraction rings provide direct evidence of the interaction between Pt and SiO sub 2 , attributed to Pt sub 2 Si and Pt sub 3 Si. It is postulated that the reduction involves atomic hydrogen, the adsorption of which is facilitated by the porous nature of the SiO sub 2 surface. 6 ref.--G.A.S. |
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ISSN: | 0040-6090 1879-2731 |
DOI: | 10.1016/0040-6090(85)90346-3 |