The Hall effect and resistivity of amorphous copper-titanium alloys

The resistivity and Hall effect of three amorphous Cu sub x Ti sub 1--x alloys between 1.24 and 300K have been studied. The use of thin film samples (prepared by RF magnetron sputtering) and a sensitive AC technique for the Hall coefficient allowed an accurate measurement of the temperature dependen...

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Veröffentlicht in:	Journal of physics. F, Metal physics Metal physics, 1987-08, Vol.17 (8), p.1739-1749
Hauptverfasser:	Drewery, J S, Friend, R H
Format:	Artikel
Sprache:	eng
Schlagworte:	Condensed matter: electronic structure, electrical, magnetic, and optical properties Cross-disciplinary physics: materials science rheology Electrical and thermal conduction in amorphous and liquid metals and alloys Electronic conduction in metals and alloys Electronic transport in condensed matter Exact sciences and technology Materials science Metals, semimetals and alloys Physics Specific materials
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Beschreibung
Zusammenfassung:	The resistivity and Hall effect of three amorphous Cu sub x Ti sub 1--x alloys between 1.24 and 300K have been studied. The use of thin film samples (prepared by RF magnetron sputtering) and a sensitive AC technique for the Hall coefficient allowed an accurate measurement of the temperature dependence of both quantities to be made. Good agreement with predictions based upon electron--electron correlation theories are found. 24 ref.--AA
ISSN:	0305-4608
DOI:	10.1088/0305-4608/17/8/020