Electrochemical deposition of aluminium on tungsten in cryolite based melts

Aluminum deposition and redissolution on tungsten electrodes in cryolite melts of different NaF/AlF sub(3) ratios have been investigated by potential sweep and galvanostatic techniques. The amount of charge necessary for anodic reoxidation of deposited aluminum was determined as well as the rate of...

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Veröffentlicht in:Journal of applied electrochemistry 1985-05, Vol.15 (3), p.393-398
Hauptverfasser: DURUZ, J. J, LANDOLT, D
Format: Artikel
Sprache:eng
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Zusammenfassung:Aluminum deposition and redissolution on tungsten electrodes in cryolite melts of different NaF/AlF sub(3) ratios have been investigated by potential sweep and galvanostatic techniques. The amount of charge necessary for anodic reoxidation of deposited aluminum was determined as well as the rate of spontaneous corrosion. The qualitative results obtained can be interpreted by assuming a mass transport controlled loss reaction involving metal dissolution in the melt.
ISSN:0021-891X
1572-8838
DOI:10.1007/BF00615991