Laser chemical vapor deposition of copper

The first laser-induced deposition of copper has been demonstrated using a volatile copper coordination complex. The technique is characterized by reasonable rates and by the high quality of copper produced.

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Bibliographische Detailangaben
Veröffentlicht in:	Applied physics letters 1985-01, Vol.46 (2), p.204-206
Hauptverfasser:	Houle, F. A., Jones, C. R., Baum, T., Pico, C., Kovac, C. A.
Format:	Artikel
Sprache:	eng
Online-Zugang:	Volltext
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Beschreibung
Zusammenfassung:	The first laser-induced deposition of copper has been demonstrated using a volatile copper coordination complex. The technique is characterized by reasonable rates and by the high quality of copper produced.
ISSN:	0003-6951 1077-3118
DOI:	10.1063/1.95685