Application of FeIII-TAML/H2O2 system for treatment of fluoroquinolone antibiotics

Over the recent past, fluoroquinolone antibiotics (FQs) have raised extensive attention due to their potential to induce the formation of resistance genes and “superbugs”, thus various advanced oxidation techniques have been developed to eliminate their release into the environment. In the present s...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Journal of environmental sciences (China) 2021-01, Vol.99, p.110-118
Hauptverfasser: Xian, Zeyu, Liang, Sijia, Jin, Xin, Tian, Haoting, Ling, Jingyi, Wang, Chao
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:Over the recent past, fluoroquinolone antibiotics (FQs) have raised extensive attention due to their potential to induce the formation of resistance genes and “superbugs”, thus various advanced oxidation techniques have been developed to eliminate their release into the environment. In the present study, the prototype tetraamido macrocyclic ligand (FeIII-TAML)/hydrogen peroxide (H2O2) system is employed to degrade FQs (i.e., norfloxacin and ciprofloxacin) over a wide pH range (i.e., pH 6-10), and the reaction rate increases with the increase in pH level. The effect of dosage of FeIII-TAML and H2O2 on the degradation of FQs is evaluated, and the reaction rate is linearly correlated with the added amount of chemicals. Moreover, the impact of natural organic matters (NOM) on the removal of FQs is investigated, and the degradation kinetics show that both NOM type and experimental concentration exhibit negligible influence on the oxidative degradation of selected antibiotics. Based on the results of liquid chromatography-high resolution mass spectrometry and theoretical calculations, the reaction sites and pathways of FQs by FeIII-TAML/H2O2 system are further predicted and elucidated. [Display omitted]
ISSN:1001-0742
1878-7320
DOI:10.1016/j.jes.2020.06.006