Oxidation behavior of obliquely deposited CoNi magnetic thin films

Oxidation behavior of obliquely deposited CoNi magnetic thin films

The oxidation behavior of Co 80Ni 20 thin films used for magnetic recording was studied using Auger and X-ray photoelectron spectroscopy. At 500 °C and under an oxygen pressure of 1 × 10 −5 Torr cobalt oxidized to CoO but nickel remained in the metallic state. The growth of CoO followed a parabolic...

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Veröffentlicht in:Thin solid films 1986-12, Vol.145 (2), p.241-247
Hauptverfasser: Majumdar, D., Gau, J.S., Spahn, R.G.
Format: Artikel
Sprache:eng
Schlagworte:
Applied sciences
Corrosion
Corrosion mechanisms
Cross-disciplinary physics: materials science
rheology
Exact sciences and technology
Materials science
Metals, semimetals and alloys
Metals. Metallurgy
Physics
Specific materials
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Zusammenfassung:The oxidation behavior of Co 80Ni 20 thin films used for magnetic recording was studied using Auger and X-ray photoelectron spectroscopy. At 500 °C and under an oxygen pressure of 1 × 10 −5 Torr cobalt oxidized to CoO but nickel remained in the metallic state. The growth of CoO followed a parabolic dependence on the oxygen exposure time, suggesting diffusion-controlled kinetics for oxidation. The [Co]/[Ni] ratio at the surface increased with oxidation indicating an oxygen-induced segregation of cobalt in the alloy.
ISSN:0040-6090
1879-2731
DOI:10.1016/0040-6090(86)90373-1