Optical phonons of aluminum nitride

Oriented polycrystalline films of AlN on Si(111) substrates and amorphous AlN films on sapphire substrates have been prepared by sputter deposition of aluminum in a nitrogen plasma. Phonons at 303, 426, 514, 614, 663, and 831 cm−1 (±3%) have been observed in the Raman spectra of the crystalline film...

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Veröffentlicht in:J. Appl. Phys.; (United States) 1984-06, Vol.55 (11), p.4010-4014
Hauptverfasser: CARLONE, C, LAKIN, K. M, SHANKS, H. R
Format: Artikel
Sprache:eng
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Zusammenfassung:Oriented polycrystalline films of AlN on Si(111) substrates and amorphous AlN films on sapphire substrates have been prepared by sputter deposition of aluminum in a nitrogen plasma. Phonons at 303, 426, 514, 614, 663, and 831 cm−1 (±3%) have been observed in the Raman spectra of the crystalline films. The 303-cm−1 phonon shifts to 288 cm−1 and the 663-cm−1 phonon to 650 cm−1 in the amorphous sample. By means of infrared absorption measurements with the electric field perpendicular to the c axis we have tentatively identified E1(LO) and E1(TO) modes near 800 and 610 cm−1, respectively. A tentative assignment of the other modes is made from partial data from orientation dependent scattering and results for other wurtzite structure compounds. A comparison of the AlN phonon frequencies with those of other known wurtzite structure compounds shows that Martin’s scaling equation is satisfied.
ISSN:0021-8979
1089-7550
DOI:10.1063/1.332989