Transient thermoreflectance from thin metal films
This report describes the first demonstration of thermal diffusivity measurements using picosecond transient thermoreflectance (TTR). Although previously reported methods of measuring thermal transport properties of thin films require precise knowledge of the thermal properties of the substrate, thi...
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Veröffentlicht in: | Journal of applied physics 1986-07, Vol.60 (1), p.285-290 |
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Hauptverfasser: | , |
Format: | Artikel |
Sprache: | eng |
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Online-Zugang: | Volltext |
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Zusammenfassung: | This report describes the first demonstration of thermal diffusivity measurements using picosecond transient thermoreflectance (TTR). Although previously reported methods of measuring thermal transport properties of thin films require precise knowledge of the thermal properties of the substrate, this technique allows measurements on films as thin as 100 nm without any evidence of substrate interaction. The TTR measurement is modeled with a one-dimensional heat flow equation using a two-parameter fitting routine to determine the thermal diffusivity. The validity of our approach is confirmed by the TTR measured thermal diffusivity of single crystal nickel. We have also measured the thermal diffusivity of sputtered and evaporated single element metal films. Preliminary results from TTR measurements on compositionally modulated structures are also presented. |
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ISSN: | 0021-8979 1089-7550 |
DOI: | 10.1063/1.337642 |