Gas adsorption on thin films of chromium studied by internal stress measurements
The effect of O 2, H 2O, CO, H 2, N 2 and CH 4 adsorption on the internal stress of evaporated chromium films was investigated under high vacuum conditions. While the stress in chromium films is not altered during exposure to H 2, CH 4 and N 2 distinct stress changes are found when chromium films ar...
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| Veröffentlicht in: | Thin solid films 1984-01, Vol.111 (4), p.303-311 |
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| container_title | Thin solid films |
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| creator | Abermann, R. Martinz, H.P. |
| description | The effect of O
2, H
2O, CO, H
2, N
2 and CH
4 adsorption on the internal stress of evaporated chromium films was investigated under high vacuum conditions. While the stress in chromium films is not altered during exposure to H
2, CH
4 and N
2 distinct stress changes are found when chromium films are exposed to H
2O, CO and O
2. The adsorption of H
2O and CO on the metal film gives rise to a compressive stress, because the surface tension of the metal film is lowered owing to saturation of free surface valences at the film and the grain boundary surfaces. A different behaviour is observed for the O
2Cr interaction. On exposure of the film to O
2 a slight compressive stress is observed, which on further exposure changes to a tensile stress. While the compressive stress is again believed to be due to the formation of an adsorption layer, the subsequent tensile stress is interpreted as indicating the formation of a protective layer of bulk chromium oxide. The thickness of this protective layer depends on the O
2 exposure pressure. The chromium oxide layer is impermeable to O
2 and CO, but not to H
2O. |
| doi_str_mv | 10.1016/0040-6090(84)90322-5 |
| format | Article |
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2, H
2O, CO, H
2, N
2 and CH
4 adsorption on the internal stress of evaporated chromium films was investigated under high vacuum conditions. While the stress in chromium films is not altered during exposure to H
2, CH
4 and N
2 distinct stress changes are found when chromium films are exposed to H
2O, CO and O
2. The adsorption of H
2O and CO on the metal film gives rise to a compressive stress, because the surface tension of the metal film is lowered owing to saturation of free surface valences at the film and the grain boundary surfaces. A different behaviour is observed for the O
2Cr interaction. On exposure of the film to O
2 a slight compressive stress is observed, which on further exposure changes to a tensile stress. While the compressive stress is again believed to be due to the formation of an adsorption layer, the subsequent tensile stress is interpreted as indicating the formation of a protective layer of bulk chromium oxide. The thickness of this protective layer depends on the O
2 exposure pressure. The chromium oxide layer is impermeable to O
2 and CO, but not to H
2O.</description><identifier>ISSN: 0040-6090</identifier><identifier>EISSN: 1879-2731</identifier><identifier>DOI: 10.1016/0040-6090(84)90322-5</identifier><identifier>CODEN: THSFAP</identifier><language>eng</language><publisher>Lausanne: Elsevier B.V</publisher><subject>Applied sciences ; Chemistry ; Cross-disciplinary physics: materials science; rheology ; Exact sciences and technology ; General and physical chemistry ; Materials science ; Metals, semimetals and alloys ; Metals. Metallurgy ; Physics ; Solid-gas interface ; Specific materials ; Surface physical chemistry</subject><ispartof>Thin solid films, 1984-01, Vol.111 (4), p.303-311</ispartof><rights>1984</rights><rights>1984 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c364t-1206082524d8b56623ced2b73ac617092155b1d5b3109178c69965beaf7ec2fa3</citedby><cites>FETCH-LOGICAL-c364t-1206082524d8b56623ced2b73ac617092155b1d5b3109178c69965beaf7ec2fa3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://dx.doi.org/10.1016/0040-6090(84)90322-5$$EHTML$$P50$$Gelsevier$$H</linktohtml><link.rule.ids>314,780,784,3550,27924,27925,45995</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=9618687$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>Abermann, R.</creatorcontrib><creatorcontrib>Martinz, H.P.</creatorcontrib><title>Gas adsorption on thin films of chromium studied by internal stress measurements</title><title>Thin solid films</title><description>The effect of O
2, H
2O, CO, H
2, N
2 and CH
4 adsorption on the internal stress of evaporated chromium films was investigated under high vacuum conditions. While the stress in chromium films is not altered during exposure to H
2, CH
4 and N
2 distinct stress changes are found when chromium films are exposed to H
2O, CO and O
2. The adsorption of H
2O and CO on the metal film gives rise to a compressive stress, because the surface tension of the metal film is lowered owing to saturation of free surface valences at the film and the grain boundary surfaces. A different behaviour is observed for the O
2Cr interaction. On exposure of the film to O
2 a slight compressive stress is observed, which on further exposure changes to a tensile stress. While the compressive stress is again believed to be due to the formation of an adsorption layer, the subsequent tensile stress is interpreted as indicating the formation of a protective layer of bulk chromium oxide. The thickness of this protective layer depends on the O
2 exposure pressure. The chromium oxide layer is impermeable to O
2 and CO, but not to H
2O.</description><subject>Applied sciences</subject><subject>Chemistry</subject><subject>Cross-disciplinary physics: materials science; rheology</subject><subject>Exact sciences and technology</subject><subject>General and physical chemistry</subject><subject>Materials science</subject><subject>Metals, semimetals and alloys</subject><subject>Metals. Metallurgy</subject><subject>Physics</subject><subject>Solid-gas interface</subject><subject>Specific materials</subject><subject>Surface physical chemistry</subject><issn>0040-6090</issn><issn>1879-2731</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>1984</creationdate><recordtype>article</recordtype><recordid>eNp9kEtLBDEQhIMouD7-gYccRPQwmmSSTHIRZPEFC3rQc8hketjIPNb0jLD_3ll32aPQ0NB8VU0VIRec3XLG9R1jkmWaWXZt5I1luRCZOiAzbgqbiSLnh2S2R47JCeIXY4wLkc_I-7NH6ivs02qIfUenGZaxo3VsWqR9TcMy9W0cW4rDWEWoaLmmsRsgdb6ZbgkQaQsexwQtdAOekaPaNwjnu31KPp8eP-Yv2eLt-XX-sMhCruWQccE0M0IJWZlSaS3yAJUoi9wHzQtmBVeq5JUqc84sL0zQ1mpVgq8LCKL2-Sm52vquUv89Ag6ujRigaXwH_YhOSCGUlGIC5RYMqUdMULtViq1Pa8eZ29TnNt24TTfOSPdXn1OT7HLn7zH4pk6-CxH3Wqu50aaYsPstBlPWnwjJYYjQTWFigjC4qo____kF2zyDCw</recordid><startdate>19840101</startdate><enddate>19840101</enddate><creator>Abermann, R.</creator><creator>Martinz, H.P.</creator><general>Elsevier B.V</general><general>Elsevier Science</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>8BQ</scope><scope>8FD</scope><scope>JG9</scope></search><sort><creationdate>19840101</creationdate><title>Gas adsorption on thin films of chromium studied by internal stress measurements</title><author>Abermann, R. ; Martinz, H.P.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c364t-1206082524d8b56623ced2b73ac617092155b1d5b3109178c69965beaf7ec2fa3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>1984</creationdate><topic>Applied sciences</topic><topic>Chemistry</topic><topic>Cross-disciplinary physics: materials science; rheology</topic><topic>Exact sciences and technology</topic><topic>General and physical chemistry</topic><topic>Materials science</topic><topic>Metals, semimetals and alloys</topic><topic>Metals. Metallurgy</topic><topic>Physics</topic><topic>Solid-gas interface</topic><topic>Specific materials</topic><topic>Surface physical chemistry</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Abermann, R.</creatorcontrib><creatorcontrib>Martinz, H.P.</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><jtitle>Thin solid films</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Abermann, R.</au><au>Martinz, H.P.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Gas adsorption on thin films of chromium studied by internal stress measurements</atitle><jtitle>Thin solid films</jtitle><date>1984-01-01</date><risdate>1984</risdate><volume>111</volume><issue>4</issue><spage>303</spage><epage>311</epage><pages>303-311</pages><issn>0040-6090</issn><eissn>1879-2731</eissn><coden>THSFAP</coden><abstract>The effect of O
2, H
2O, CO, H
2, N
2 and CH
4 adsorption on the internal stress of evaporated chromium films was investigated under high vacuum conditions. While the stress in chromium films is not altered during exposure to H
2, CH
4 and N
2 distinct stress changes are found when chromium films are exposed to H
2O, CO and O
2. The adsorption of H
2O and CO on the metal film gives rise to a compressive stress, because the surface tension of the metal film is lowered owing to saturation of free surface valences at the film and the grain boundary surfaces. A different behaviour is observed for the O
2Cr interaction. On exposure of the film to O
2 a slight compressive stress is observed, which on further exposure changes to a tensile stress. While the compressive stress is again believed to be due to the formation of an adsorption layer, the subsequent tensile stress is interpreted as indicating the formation of a protective layer of bulk chromium oxide. The thickness of this protective layer depends on the O
2 exposure pressure. The chromium oxide layer is impermeable to O
2 and CO, but not to H
2O.</abstract><cop>Lausanne</cop><pub>Elsevier B.V</pub><doi>10.1016/0040-6090(84)90322-5</doi><tpages>9</tpages></addata></record> |
| fulltext | fulltext |
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| ispartof | Thin solid films, 1984-01, Vol.111 (4), p.303-311 |
| issn | 0040-6090 1879-2731 |
| language | eng |
| recordid | cdi_proquest_miscellaneous_24225442 |
| source | Elsevier ScienceDirect Journals Complete |
| subjects | Applied sciences Chemistry Cross-disciplinary physics: materials science rheology Exact sciences and technology General and physical chemistry Materials science Metals, semimetals and alloys Metals. Metallurgy Physics Solid-gas interface Specific materials Surface physical chemistry |
| title | Gas adsorption on thin films of chromium studied by internal stress measurements |
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