Upper critical fields of superconducting Nb3Ge films
The upper critical field Hc2 (4.2 K) of superconducting Nb3Ge films prepared by sputtering and chemical vapor deposition (CVD) has been measured in a pulsed field. The Hc2 of these films is generally related to their superconducting critical temperature Tc. Sputtered films exhibit a linear increase...
Gespeichert in:
Veröffentlicht in: | Journal of applied physics 1986-02, Vol.59 (3), p.975-977 |
---|---|
Hauptverfasser: | , , , |
Format: | Artikel |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | The upper critical field Hc2 (4.2 K) of superconducting Nb3Ge films prepared by sputtering and chemical vapor deposition (CVD) has been measured in a pulsed field. The Hc2 of these films is generally related to their superconducting critical temperature Tc. Sputtered films exhibit a linear increase of Hc2 from 25.4 to 33.3 T for a Tc range 18.6–21.3 K. Although the data of CVD-prepared films are scattered due to nonuniformity in the films, a similar dependence of Hc2 on Tc has been found. |
---|---|
ISSN: | 0021-8979 1089-7550 |
DOI: | 10.1063/1.336577 |