A new technique for the formation of ultrafine particles by sputtering
A gas evaporation technique using sputtering is newly developed. The characteristic of this new technique is the use of sputtering in an atmosphere of higher gas pressure such as 0.5 to 100 Torr than is used for ordinary sputtering. W, Ag and Cu are tested and their ultrafine particles are formed. W...
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| Veröffentlicht in: | Japanese Journal of Applied Physics 1986, Vol.25 (1), p.L42-L44 |
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| Hauptverfasser: | , , , |
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| container_end_page | L44 |
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| container_issue | 1 |
| container_start_page | L42 |
| container_title | Japanese Journal of Applied Physics |
| container_volume | 25 |
| creator | YATSUYA, S KAMAKURA, T YAMAUCHI, K MIHAMA, K |
| description | A gas evaporation technique using sputtering is newly developed. The characteristic of this new technique is the use of sputtering in an atmosphere of higher gas pressure such as 0.5 to 100 Torr than is used for ordinary sputtering. W, Ag and Cu are tested and their ultrafine particles are formed. WC
1-
x
particles are also prepared by reactive sputtering. |
| doi_str_mv | 10.1143/jjap.25.l42 |
| format | Article |
| fullrecord | <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_miscellaneous_24171496</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>24171496</sourcerecordid><originalsourceid>FETCH-LOGICAL-c415t-5214d29c664decfaaa1a1cb0c2b7c4ce3b31e98d0d1606b014ec577438e75633</originalsourceid><addsrcrecordid>eNqFkM9LwzAcxYMoOKcn_4EcxIt05ptfbY5jOHUM9LB7SNPUZXRtTVJk_73VDa-eHg8-7_F4CN0CmQFw9rjbmX5Gxazh9AxNgPE840SKczQhhELGFaWX6CrG3Wil4DBByzlu3RdOzm5b_zk4XHcBp-2v7k3yXYu7Gg9NCqb2rcO9CcnbxkVcHnDsh5Rc8O3HNbqoTRPdzUmnaLN82ixesvXb8-tivs4sB5EyQYFXVFkpeeVsbYwBA7Yklpa55daxkoFTRUUqkESWBLizIs85K1wuJGNTdH-s7UM3jo1J7320rmlM67ohasohB67kCD4cQRu6GIOrdR_83oSDBqJ_rtKr1fxdU6HXnI703anWRGuaOpjW-vgXKYBIxcS_GFGqEIp9A0dqdhI</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>24171496</pqid></control><display><type>article</type><title>A new technique for the formation of ultrafine particles by sputtering</title><source>IOP Publishing Journals</source><source>Institute of Physics (IOP) Journals - HEAL-Link</source><creator>YATSUYA, S ; KAMAKURA, T ; YAMAUCHI, K ; MIHAMA, K</creator><creatorcontrib>YATSUYA, S ; KAMAKURA, T ; YAMAUCHI, K ; MIHAMA, K</creatorcontrib><description>A gas evaporation technique using sputtering is newly developed. The characteristic of this new technique is the use of sputtering in an atmosphere of higher gas pressure such as 0.5 to 100 Torr than is used for ordinary sputtering. W, Ag and Cu are tested and their ultrafine particles are formed. WC
1-
x
particles are also prepared by reactive sputtering.</description><identifier>ISSN: 0021-4922</identifier><identifier>EISSN: 1347-4065</identifier><identifier>DOI: 10.1143/jjap.25.l42</identifier><identifier>CODEN: JJAPA5</identifier><language>eng</language><publisher>Tokyo: Japanese journal of applied physics</publisher><subject>Applied sciences ; Condensed matter: electronic structure, electrical, magnetic, and optical properties ; Cross-disciplinary physics: materials science; rheology ; Electron and ion emission by liquids and solids; impact phenomena ; Exact sciences and technology ; Impact phenomena (including electron spectra and sputtering) ; Materials science ; Metals, semimetals and alloys ; Optical properties and condensed-matter spectroscopy and other interactions of matter with particles and radiation ; Other electron-impact emission phenomena ; Other interactions of matter with particles and radiation ; Other techniques and industries ; Physics ; Specific materials</subject><ispartof>Japanese Journal of Applied Physics, 1986, Vol.25 (1), p.L42-L44</ispartof><rights>1987 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c415t-5214d29c664decfaaa1a1cb0c2b7c4ce3b31e98d0d1606b014ec577438e75633</citedby><cites>FETCH-LOGICAL-c415t-5214d29c664decfaaa1a1cb0c2b7c4ce3b31e98d0d1606b014ec577438e75633</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,777,781,4010,27904,27905,27906</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=8099859$$DView record in Pascal Francis$$Hfree_for_read</backlink><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=8106935$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>YATSUYA, S</creatorcontrib><creatorcontrib>KAMAKURA, T</creatorcontrib><creatorcontrib>YAMAUCHI, K</creatorcontrib><creatorcontrib>MIHAMA, K</creatorcontrib><title>A new technique for the formation of ultrafine particles by sputtering</title><title>Japanese Journal of Applied Physics</title><description>A gas evaporation technique using sputtering is newly developed. The characteristic of this new technique is the use of sputtering in an atmosphere of higher gas pressure such as 0.5 to 100 Torr than is used for ordinary sputtering. W, Ag and Cu are tested and their ultrafine particles are formed. WC
1-
x
particles are also prepared by reactive sputtering.</description><subject>Applied sciences</subject><subject>Condensed matter: electronic structure, electrical, magnetic, and optical properties</subject><subject>Cross-disciplinary physics: materials science; rheology</subject><subject>Electron and ion emission by liquids and solids; impact phenomena</subject><subject>Exact sciences and technology</subject><subject>Impact phenomena (including electron spectra and sputtering)</subject><subject>Materials science</subject><subject>Metals, semimetals and alloys</subject><subject>Optical properties and condensed-matter spectroscopy and other interactions of matter with particles and radiation</subject><subject>Other electron-impact emission phenomena</subject><subject>Other interactions of matter with particles and radiation</subject><subject>Other techniques and industries</subject><subject>Physics</subject><subject>Specific materials</subject><issn>0021-4922</issn><issn>1347-4065</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>1986</creationdate><recordtype>article</recordtype><recordid>eNqFkM9LwzAcxYMoOKcn_4EcxIt05ptfbY5jOHUM9LB7SNPUZXRtTVJk_73VDa-eHg8-7_F4CN0CmQFw9rjbmX5Gxazh9AxNgPE840SKczQhhELGFaWX6CrG3Wil4DBByzlu3RdOzm5b_zk4XHcBp-2v7k3yXYu7Gg9NCqb2rcO9CcnbxkVcHnDsh5Rc8O3HNbqoTRPdzUmnaLN82ixesvXb8-tivs4sB5EyQYFXVFkpeeVsbYwBA7Yklpa55daxkoFTRUUqkESWBLizIs85K1wuJGNTdH-s7UM3jo1J7320rmlM67ohasohB67kCD4cQRu6GIOrdR_83oSDBqJ_rtKr1fxdU6HXnI703anWRGuaOpjW-vgXKYBIxcS_GFGqEIp9A0dqdhI</recordid><startdate>1986</startdate><enddate>1986</enddate><creator>YATSUYA, S</creator><creator>KAMAKURA, T</creator><creator>YAMAUCHI, K</creator><creator>MIHAMA, K</creator><general>Japanese journal of applied physics</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>8BQ</scope><scope>8FD</scope><scope>JG9</scope></search><sort><creationdate>1986</creationdate><title>A new technique for the formation of ultrafine particles by sputtering</title><author>YATSUYA, S ; KAMAKURA, T ; YAMAUCHI, K ; MIHAMA, K</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c415t-5214d29c664decfaaa1a1cb0c2b7c4ce3b31e98d0d1606b014ec577438e75633</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>1986</creationdate><topic>Applied sciences</topic><topic>Condensed matter: electronic structure, electrical, magnetic, and optical properties</topic><topic>Cross-disciplinary physics: materials science; rheology</topic><topic>Electron and ion emission by liquids and solids; impact phenomena</topic><topic>Exact sciences and technology</topic><topic>Impact phenomena (including electron spectra and sputtering)</topic><topic>Materials science</topic><topic>Metals, semimetals and alloys</topic><topic>Optical properties and condensed-matter spectroscopy and other interactions of matter with particles and radiation</topic><topic>Other electron-impact emission phenomena</topic><topic>Other interactions of matter with particles and radiation</topic><topic>Other techniques and industries</topic><topic>Physics</topic><topic>Specific materials</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>YATSUYA, S</creatorcontrib><creatorcontrib>KAMAKURA, T</creatorcontrib><creatorcontrib>YAMAUCHI, K</creatorcontrib><creatorcontrib>MIHAMA, K</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><jtitle>Japanese Journal of Applied Physics</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>YATSUYA, S</au><au>KAMAKURA, T</au><au>YAMAUCHI, K</au><au>MIHAMA, K</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>A new technique for the formation of ultrafine particles by sputtering</atitle><jtitle>Japanese Journal of Applied Physics</jtitle><date>1986</date><risdate>1986</risdate><volume>25</volume><issue>1</issue><spage>L42</spage><epage>L44</epage><pages>L42-L44</pages><issn>0021-4922</issn><eissn>1347-4065</eissn><coden>JJAPA5</coden><abstract>A gas evaporation technique using sputtering is newly developed. The characteristic of this new technique is the use of sputtering in an atmosphere of higher gas pressure such as 0.5 to 100 Torr than is used for ordinary sputtering. W, Ag and Cu are tested and their ultrafine particles are formed. WC
1-
x
particles are also prepared by reactive sputtering.</abstract><cop>Tokyo</cop><pub>Japanese journal of applied physics</pub><doi>10.1143/jjap.25.l42</doi></addata></record> |
| fulltext | fulltext |
| identifier | ISSN: 0021-4922 |
| ispartof | Japanese Journal of Applied Physics, 1986, Vol.25 (1), p.L42-L44 |
| issn | 0021-4922 1347-4065 |
| language | eng |
| recordid | cdi_proquest_miscellaneous_24171496 |
| source | IOP Publishing Journals; Institute of Physics (IOP) Journals - HEAL-Link |
| subjects | Applied sciences Condensed matter: electronic structure, electrical, magnetic, and optical properties Cross-disciplinary physics: materials science rheology Electron and ion emission by liquids and solids impact phenomena Exact sciences and technology Impact phenomena (including electron spectra and sputtering) Materials science Metals, semimetals and alloys Optical properties and condensed-matter spectroscopy and other interactions of matter with particles and radiation Other electron-impact emission phenomena Other interactions of matter with particles and radiation Other techniques and industries Physics Specific materials |
| title | A new technique for the formation of ultrafine particles by sputtering |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-19T00%3A10%3A18IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=A%20new%20technique%20for%20the%20formation%20of%20ultrafine%20particles%20by%20sputtering&rft.jtitle=Japanese%20Journal%20of%20Applied%20Physics&rft.au=YATSUYA,%20S&rft.date=1986&rft.volume=25&rft.issue=1&rft.spage=L42&rft.epage=L44&rft.pages=L42-L44&rft.issn=0021-4922&rft.eissn=1347-4065&rft.coden=JJAPA5&rft_id=info:doi/10.1143/jjap.25.l42&rft_dat=%3Cproquest_cross%3E24171496%3C/proquest_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=24171496&rft_id=info:pmid/&rfr_iscdi=true |