The preparation, characterization and applications of silicon nitride thin films

The preparation, characterization and applications of silicon nitride thin films

This is a comprehensive review of the preparation, characterization, and applications of Si sub 3 N sub 4 thin films used on a large scale in semiconductor device and integrated circuit technology. 297 refs.

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Veröffentlicht in:Thin Solid Films 1980-01, Vol.65 (2), p.171-208
1. Verfasser: Morosanu, C.-E.
Format: Artikel
Sprache:eng
Online-Zugang:Volltext
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Zusammenfassung:This is a comprehensive review of the preparation, characterization, and applications of Si sub 3 N sub 4 thin films used on a large scale in semiconductor device and integrated circuit technology. 297 refs.
ISSN:0040-6090
1879-2731
DOI:10.1016/0040-6090(80)90254-0