A model for fluorine atom recombination on a nickel surface

A detailed steady-state model for fluorine atom recombination on a nickel catalytic surface was developed based on the Langmuir-Rideal heterogeneous reaction mechanism. The model was compared to fluorine wall recombination data for a dilute mixture of atomic and diatomic fluorine in an inert diluent...

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Veröffentlicht in:Journal of physical chemistry (1952) 1980-01, Vol.84 (1), p.41-50
Hauptverfasser: Jumper, Eric J, Ultee, Casper J, Dorko, Ernest A
Format: Artikel
Sprache:eng
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Zusammenfassung:A detailed steady-state model for fluorine atom recombination on a nickel catalytic surface was developed based on the Langmuir-Rideal heterogeneous reaction mechanism. The model was compared to fluorine wall recombination data for a dilute mixture of atomic and diatomic fluorine in an inert diluent. The mixture flowed in a nickel tube. The model is able to duplicate the character of the data and to predict fluorine recombination coefficients as a function of temperature and other influencing conditions.
ISSN:0022-3654
1541-5740
DOI:10.1021/j100438a011