High-temperature relaxation mechanisms in inorganic glasses
At temperatures below T g two relaxation processes are observed in sheet glass (200–500°C) and low-alkali glass (300–600°C): the fast R 1 and the slow R 2 processes which are not connected with the viscous flow, and the structural relaxation occurring R 3 above T g. The processes R 1 and R 2 proceed...
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Veröffentlicht in: | Journal of non-crystalline solids 1980-01, Vol.37 (2), p.285-298 |
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Sprache: | eng |
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Zusammenfassung: | At temperatures below
T
g two relaxation processes are observed in sheet glass (200–500°C) and low-alkali glass (300–600°C): the fast
R
1 and the slow
R
2 processes which are not connected with the viscous flow, and the structural relaxation occurring
R
3 above
T
g. The processes
R
1 and
R
2 proceed at an invariable structure and are characterized by activation energies as high as 5 kcal mol
−1 and 13–15 kcal mol
−1, respectively. The contribution of
R
2 amounts to 70–80%. The process
R
3, observed near and above
T
g, is accompanied with structural variations and, therefore, its activation energy depends on temperature; at
T
g it is equal to 60 kcal mol
−1.
The processes
R
1 and
R
2 are due to the mobility and rearrangement of large kinetic units. On the contrary,
R
3 is characterized by a low volume of kinetic units. This shows that the ions of silicon and oxygen are involved in this process. The relaxation process
R
1 is assumed to be connected with the local fluctuation deformationsof the glass network as in the case of reverse glass deformation under high pressures, and the process
R
2 with the mobility of microscopic areas of the glass micro-inhomogeneous structure (structural complexes, microblocks). The continuous spectra corroborate the existence of several high-temperature relaxation processes in silicate glasses.
Thus, three relaxation processes are observed in alkali-silicate glasses in the temperature range 200–600°C: the processes
R
1 and
R
2 are mechanical relaxations, whereas the process
R
3 is a structural relaxation determining the viscous flow of glass. The contribution of
R
3 to stress relaxation amounts to 5%.
There exists a temperature
T
k
(20–30° below
T
g) which is the upper limit of the process
R
2. At higher temperatures beginning from
T
k
the stress relaxation is first determined by the two processes
R
1 and
R
3, and then by one process
R
3. At temperatures below
T
k
all three processes determine the stress relaxation, but with the decreasing temperature the rate of
R
3 becomes negligible and, therefore, in the glass annealing range (below
T
k
) the mechanical relaxation
R
2 and
R
1 are mainly responsible; their contribution to the whole relaxation process is as high as 95%. |
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ISSN: | 0022-3093 1873-4812 |
DOI: | 10.1016/0022-3093(80)90158-1 |